Nanostructuring HfO2 thin films as antireflection coatings

Journal of the American Ceramic Society

Volumn 92, Issue 12, 2009, Pages 3077-3080

  Ni, Jie ^a   Zhu, Yu ^a   Wang, Sihong ^a   Li, Zhengcao ^a   Zhang, Zhengjun ^a   Wei, Bingqing ^b  

^a TSINGHUA UNIVERSITY   (China)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENT SUBSTRATES; GLANCING ANGLE DEPOSITION TECHNIQUE; HAFNIUM DIOXIDE; NANO-STRUCTURED; NANO-STRUCTURING; POROUS MORPHOLOGY; SILICON SUBSTRATES; VISIBLE LIGHT;

COATINGS; HAFNIUM; HAFNIUM COMPOUNDS; LIGHT REFLECTION; LIGHT REFRACTION; POROUS SILICON; REFRACTIVE INDEX; REFRACTOMETERS; SILICON CARBIDE; SUBSTRATES; THIN FILMS;

ANTIREFLECTION COATINGS;

EID: 70450237611     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2009.03306.x     Document Type: Article

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