Uniform Si nanostructures grown by oblique angle deposition with substrate swing rotation

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1717-1723

  Ye, D X ^a   Karabacak, T ^a   Picu, R C ^b   Wang, G C ^a   Lu, T M ^a  

^a Research Rensselaer Polytechnic Institute   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; FABRICATION; SEMICONDUCTOR GROWTH; SILICON; SUBSTRATES; THREE DIMENSIONAL;

DEPOSITION FLUX; NANO-COLUMNS; NANO-DEVICES; OBLIQUE ANGLE DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 23444441921     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/052     Document Type: Review

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