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Volumn 94, Issue 1, 2010, Pages 68-74

Effect of ITO buffer layers on the structural, optical and electrical properties of ZnO multilayer thin films prepared by pulsed laser deposition technique

Author keywords

Hall Williamson plot; Nanostructured zinc oxide films; Pulsed laser deposition; Temperature dependent electrical resistivity studies; ZnO ITO ZnO ITO ZnO multilayered thin films

Indexed keywords

AFM; AFM IMAGE; AS-DEPOSITED THIN FILMS; AVERAGE GRAIN SIZE; CO-EXISTENCE; CRYSTALLINE QUALITY; DC RESISTIVITY; DEEP LEVEL; DEPOSITION TIME; ELECTRICAL RESISTIVITY; ELECTRICAL RESISTIVITY MEASUREMENTS; ELECTRICAL STUDIES; FOUR-PROBE TECHNIQUES; HALL-WILLIAMSON PLOT; HIGH TRANSMITTANCE; MEAN SURFACE ROUGHNESS; MULTI-LAYER THIN FILM; MULTILAYERED THIN FILMS; NANOSTRUCTURED ZINC OXIDE FILMS; NEAR BAND EDGE; OPTICAL AND ELECTRICAL PROPERTIES; OPTOELECTRONIC DEVICE FABRICATION; OXYGEN PRESSURE; PHOTOLUMINESCENCE SPECTRUM; PL SPECTRA; POLYCRYSTALLINE; PULSED-LASER DEPOSITION TECHNIQUE; QUARTZ SUBSTRATE; SUBSTRATE TEMPERATURE; TEMPERATURE DEPENDENT; TEMPERATURE-DEPENDENT ELECTRICAL RESISTIVITY STUDIES; UV- AND; UV-VISIBLE SPECTRA; VISIBLE REGION; XRD PATTERNS; ZNO; ZNO LAYERS; ZNO THIN FILM; ZNO/ITO/ZNO/ITO/ZNO MULTILAYERED THIN FILMS;

EID: 70449522376     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.02.017     Document Type: Article
Times cited : (60)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.