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Thin Solid Films

Volumn 518, Issue 5, 2009, Pages 1503-1507

Annealing effect on the structural, mechanical and electrical properties of titanium-doped diamond-like carbon films

(7) Lin, Yu Hung a Lin, Hong Da a Liu, Chun Kuo a Huang, Meng Wen b Chen, Ya Chi b Chen, Jiann Ruey a Shih, Han C a,c

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

c CHINESE CULTURE UNIVERSITY (Taiwan)

Author keywords

Diamond like carbon (DLC); Metal vapor vacuum arc (MeVVA); Thermal annealing; Ti doped DLC

Indexed keywords

ANNEALING EFFECTS; ANNEALING PROCESS; ANNEALING TEMPERATURES; ATOMIC BONDS; DIAMOND-LIKE CARBON (DLC); DOPED DIAMOND-LIKE CARBON; ELECTRICAL RESISTIVITY; FILTERED CATHODIC VACUUM ARC; GRAPHITIC DOMAINS; HIGHER TEMPERATURES; INDUCED DEFECTS; MECHANICAL AND ELECTRICAL PROPERTIES; METAL VAPOR VACUUM ARC (MEVVA); METAL VAPOR VACUUM ARCS; NANOCRYSTALLINES; NUMBER AND SIZE; RAMAN SPECTRA; SI SUBSTRATES; SMOOTH SURFACE; THERMAL ANNEALING; TI CONTENT; TI-DOPED DLC;

AMORPHOUS FILMS; ANNEALING; CAVITY RESONATORS; CRYSTALLINE MATERIALS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; ELECTRIC CONDUCTIVITY; GRAPHITE; GRAPHITIZATION; HARDNESS; MECHANICAL PROPERTIES; METAL ANALYSIS; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS; TITANIUM; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; VAPORS;

CARBON FILMS;

EID: 70449505402 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.09.096 Document Type: Article

Times cited : (44)

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