Synthesis of conductive Ti-C:H films on the stainless steel plates by PECVD process

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5390-5394

  Cho, Yong K ^a   Jang, Woo S ^a   Yoo, Sehoon ^a   Kim, Sang G ^a   Kim, Sung W ^a  

^a Korea Institute of Industrial Technology   (South Korea)

Author keywords

Auxiliary glow discharge source; DLC; Electrical conductivity; PECVD; Ti C:H films

Indexed keywords

CHEMICAL PROPERTIES; CONDUCTIVE FILMS; DIAMONDS; ELECTRIC DISCHARGES; GLOW DISCHARGES; INERT GAS WELDING; PLASMA DEPOSITION; SILICON; SILICON WAFERS; STAINLESS STEEL; STEEL; STEEL CORROSION; STEEL METALLURGY; STRUCTURAL PANELS;

ANTI-CORROSION PROPERTIES; AUXILIARY GLOW DISCHARGE SOURCE; C:H FILMS; CONDUCTIVE DIAMONDS; DLC; ELECTRICAL CONDUCTIVITY; PECVD; SI(100); STAINLESS STEEL PLATES; TI-C:H FILMS; WAFER SUBSTRATES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 50349085492     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.144     Document Type: Article

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