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Volumn 169-170, Issue , 2003, Pages 287-290
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Deposition and characterization of Ti- and W-containing diamond-like carbon films by plasma source ion implantation
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Author keywords
DLC; Metal containing DLC; PSII; Reactive magnetron sputtering; Wear
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Indexed keywords
DEPOSITION;
ION IMPLANTATION;
MAGNETRON SPUTTERING;
SILICON WAFERS;
TITANIUM;
TUNGSTEN;
DISCHARGE CHAMBER;
DIAMOND LIKE CARBON FILMS;
COATING;
DIAMOND-LIKE CARBON;
ION IMPLANTATION;
PLASMA TREATMENT;
SURFACE TREATMENT;
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EID: 0038807569
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(03)00065-3 Document Type: Article |
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Times cited : (59)
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References (11)
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