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Volumn , Issue , 2009, Pages 284-287

Characterization of threshold voltage instability after program in charge trap flash memory

Author keywords

Charge trap flash; Component; Electron detrapping; Lateral spreading; Threshold voltage shift

Indexed keywords

CHARGE TRAP FLASH; COMPONENT; ELECTRON DETRAPPING; LATERAL SPREADING; THRESHOLD VOLTAGE SHIFT;

EID: 70449123684     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IRPS.2009.5173265     Document Type: Conference Paper
Times cited : (9)

References (9)
  • 2
    • 33847707730 scopus 로고    scopus 로고
    • Technology for sub-50nm DRAM and NAND flash manufacturing, 2005
    • K. Kim, "Technology for sub-50nm DRAM and NAND flash manufacturing", 2005 IEDM Tech. Dig., pp. 333-336, 2005.
    • (2005) IEDM Tech. Dig , pp. 333-336
    • Kim, K.1
  • 4
    • 0034784950 scopus 로고    scopus 로고
    • A novel analysis method of threshold voltage shift due to detrap in a multilevel flash memory
    • R. Yamada, T. Sekiguchi, Y. Okuyama, J. Yugami, and H. Kume, "A novel analysis method of threshold voltage shift due to detrap in a multilevel flash memory", Tech. Dig. 2001 VLSI Tech. Symp. pp. 115-116, 2001.
    • (2001) Tech. Dig. 2001 VLSI Tech. Symp , pp. 115-116
    • Yamada, R.1    Sekiguchi, T.2    Okuyama, Y.3    Yugami, J.4    Kume, H.5
  • 5
    • 0028755689 scopus 로고
    • Read-disturb degradation mechanism due to electron trappingin the tunnel oxide for low-voltage flash memories, 1994
    • M. Kato, N. Miyamoto, H. Kume, A. Satoh, T. Adachi, M. Ushiyama, and K. Kimura, "Read-disturb degradation mechanism due to electron trappingin the tunnel oxide for low-voltage flash memories", 1994 IEDM Tech Dig., pp. 45-48, 1994.
    • (1994) IEDM Tech Dig , pp. 45-48
    • Kato, M.1    Miyamoto, N.2    Kume, H.3    Satoh, A.4    Adachi, T.5    Ushiyama, M.6    Kimura, K.7
  • 6
    • 10644273634 scopus 로고    scopus 로고
    • A transient analysis method to characterize the trap vertical location in nitride-trapping devices
    • H. T. Lue, Y. H. Shih, K.Y. Hsieh, R. Liu, and C. Y. Lu, "A transient analysis method to characterize the trap vertical location in nitride-trapping devices", IEEE Electron Device Lett. vol. 25, pp. 816-818, 2004.
    • (2004) IEEE Electron Device Lett , vol.25 , pp. 816-818
    • Lue, H.T.1    Shih, Y.H.2    Hsieh, K.Y.3    Liu, R.4    Lu, C.Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.