A facile photochemical surface modification technique for the generation of microstructured fluorinated surfaces

Langmuir

Volumn 20, Issue 23, 2004, Pages 10080-10085

  Jeyaprakash, J D ^a   Samuel, S ^a   Ruhe, Jürgen ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; HEAT RESISTANCE; MICROSTRUCTURE; MONOLAYERS; PERMITTIVITY; PHOTOCHEMICAL REACTIONS; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

FLUORINATED SURFACES; PHOTOPATTERNING; POLYMER CHAINS; WAVELENGTHS;

FLUORINE CONTAINING POLYMERS;

ADHESION; DIELECTRIC CONSTANT; MICROSTRUCTURE; MONOLAYERS; PHOTOCHEMISTRY; SURFACE ENERGY; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

EID: 9144226969     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la049428s     Document Type: Article

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