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Volumn 56, Issue 11, 2009, Pages 2720-2725

Analytical quantum-confinement model for short-channel gate-all-around MOSFETs under subthreshold region

Author keywords

Gate all around (GAA); MOSFET; Quantum effects; Short channel effect

Indexed keywords

ANALYTICAL MODEL; CHANNEL GATES; DOPING CONCENTRATION; GATE-ALL-AROUND (GAA); MOSFET; MOSFETS; QUANTUM EFFECTS; QUANTUM-CONFINEMENT EFFECTS; SHORT-CHANNEL EFFECT; SUBTHRESHOLD REGION;

EID: 70350726208     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2009.2030714     Document Type: Article
Times cited : (36)

References (13)
  • 5
    • 56549124079 scopus 로고    scopus 로고
    • Theoretical study of carrier transport in silicon nanowire transistors based on the multisubband Boltzmann transport equation
    • Nov
    • S. Jin, M. V. Fischetti, and T. W. Tang, "Theoretical study of carrier transport in silicon nanowire transistors based on the multisubband Boltzmann transport equation," IEEE Trans. Electron Devices, vol. 55, no. 11, pp. 2886-2897, Nov. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.11 , pp. 2886-2897
    • Jin, S.1    Fischetti, M.V.2    Tang, T.W.3
  • 6
    • 84893264597 scopus 로고    scopus 로고
    • Modeling of electron mobility in gated silicon nanowires at room temperature: Surface roughness scattering, dielectric screening, and band nonparabolicity
    • Oct
    • S. Jin, M. V. Fischetti, and T. W. Tang, "Modeling of electron mobility in gated silicon nanowires at room temperature: Surface roughness scattering, dielectric screening, and band nonparabolicity," J. Appl. Phys., vol. 102, no. 8, p. 083 715, Oct. 2007.
    • (2007) J. Appl. Phys , vol.102 , Issue.8 , pp. 083-715
    • Jin, S.1    Fischetti, M.V.2    Tang, T.W.3
  • 8
    • 0004022746 scopus 로고    scopus 로고
    • SILVACO, Santa Clara, CA
    • ATLAS User's Manual, SILVACO, Santa Clara, CA, 2008.
    • (2008) ATLAS User's Manual
  • 9
    • 56549111411 scopus 로고    scopus 로고
    • Sensitivity of gate-all-around nanowire MOSFETs to process variations - A comparison with multigate MOSFETs
    • Nov
    • Y. S. Wu and P. Su, "Sensitivity of gate-all-around nanowire MOSFETs to process variations - A comparison with multigate MOSFETs," IEEE Trans. Electron Devices, vol. 55, no. 11, pp. 3042-3047, Nov. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.11 , pp. 3042-3047
    • Wu, Y.S.1    Su, P.2
  • 13
    • 33846325570 scopus 로고    scopus 로고
    • A compact physical model for yield under gate length and body thickness variations in nanoscale double-gate CMOS
    • Sep
    • H. Ananthan and K. Roy, "A compact physical model for yield under gate length and body thickness variations in nanoscale double-gate CMOS," IEEE Trans. Electron Devices, vol. 53, no. 9, pp. 2151-2159, Sep. 2006.
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.9 , pp. 2151-2159
    • Ananthan, H.1    Roy, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.