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Volumn 87, Issue 1, 2010, Pages 83-87
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A maskless laser-write lithography processing of thin-film transistors on a hemispherical surface
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Author keywords
Maskless lithography; Non planar surface; Thin film transistor
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Indexed keywords
A-SI:H;
A-SI:H TFT;
CURVED SURFACES;
FABRICATION METHOD;
FIELD-EFFECT MOBILITIES;
HEMISPHERICAL SURFACES;
HYDROGENATED AMORPHOUS SILICON (A-SI:H);
MASK LESS;
MASKLESS LITHOGRAPHY;
NON-PLANAR SUBSTRATES;
NON-PLANAR SURFACE;
ON/OFF CURRENT RATIO;
PLANAR SENSOR ARRAY;
SATURATION REGIME;
AMORPHOUS FILMS;
AMORPHOUS SILICON;
SEMICONDUCTING ORGANIC COMPOUNDS;
SENSOR ARRAYS;
THIN FILM DEVICES;
THIN FILM TRANSISTORS;
TRANSISTORS;
LITHOGRAPHY;
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EID: 70350723444
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2009.05.032 Document Type: Article |
Times cited : (21)
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References (18)
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