Mathematical model of spin-coated photoresist on a spherical substrate

Optics Express

Volumn 13, Issue 18, 2005, Pages 7070-7075

  Feng, Xiao Guo ^a,b   Sun, Lian Chun ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; MATHEMATICAL MODELS;

RADIAL POSITION; SOLVENT VOLATILIZATION; SPHERICAL SURFACE SHAPE; SPIN-COATED PHOTORESIST;

PHOTORESISTS;

EID: 24944443855     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.007070     Document Type: Article

References (9)

1. J. H. Burge, D. S. Anderson, T. D. Milster, and C. L. Vernold, "Measurement of a convex secondary mirrorusing a holographic test plat," in Proc. SPIE 2199, 193-198 (1994).
2. Yongjun XIE, Zhenwu LU, Fengyou LI, Jingli ZHAO and Zhicheng WENG, "Lithographic fabrication of large diffractive optical elements on a concave lens surface," Opt. Express10, 1043-1047 (2002).
3. S.B.G. O'Brien, L.W. Schwartz, "Theory and modeling of thin film flows," Encyclopedia of Surface and Colloid Science, Marcel Dekker, New York, 5283-5297 (2002).
4. Myers T G, Charpin J P F., "The effect of the coriolis force on axisymmetric rotating thin film flows," Int.J. Non-linear Mech. 36, 629-635 (2001).
5. A. G. Emslie, F.T. Bonner, L.G. Peck, "Flow of a viscous liquid on a rotating disk," J. Appl. Phys. 29, 858-862 (1958).
6. Acrivos A,Shah M J,and Petersen E E., "On the flow of a non-newtonian liquid on a rotating disk," J. Appl. Phys. 31, 63-968 (1960).
7. Meyerhofer D, "Characteristics of resist films produced by spinning," J. Appl. Phys. 49, 3993-3997 (1978).
8. YUE Hongda, PAN Longfa, BIN Yuejing, et al, "Mechanics analysis in CD-R dye coating process," in Proc. SPIE 4930, 253-257 (2002).
9. Peter C. Sukanek, "Spin Coating," J. Imaging Technol. 11, 184-190(1985).