Two-axis gimbal-less electrothermal micromirror for large-angle circumferential scanning

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 15, Issue 5, 2009, Pages 1432-1438

  Xu, Yingshun ^a,b   Singh, Janak ^a   Selvaratnam, Thevapriya ^b   Chen, Nanguang ^b  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Electrothermal effects; Microelectromechanical devices; Micromachining

Indexed keywords

BIMORPH ACTUATOR; DEEP REACTIVE ION ETCHING; DRIVING VOLTAGES; ELECTRO-THERMAL ACTUATORS; ELECTROTHERMAL EFFECTS; HIGH FILLS; MECHANICAL DEFLECTION; MECHANICAL DESIGN; MICRO ELECTRO MECHANICAL SYSTEM; MICRO MIRROR; MULTI-CHANNEL; SILICON ON INSULATOR; SINGLE CRYSTAL SILICON; SINGLE WAFER; TWO-AXIS;

ACTUATORS; COMPOSITE MICROMECHANICS; ELECTROSTATIC ACTUATORS; MEMS; MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

MICROELECTROMECHANICAL DEVICES;

EID: 70350200863     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2009.2016436     Document Type: Conference Paper

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