Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Kishikawa, Yasuhiro ^a   Kawashima, Miyoko ^a   Ohkubo, Akinori ^a   Iwasaki, Yuichi ^a   Takeuchi, Seiji ^a   Yoshii, Minoru ^a   Honda, Tokuyuki ^a  

^a CANON INC   (Japan)

Author keywords

Immersion lithography; Interferometric; Photoacid diffusion; Photoresist; Resist blur

Indexed keywords

DIFFUSION; INTERFEROMETRY; NEGATIVE IONS; PHOTORESISTS; THERMAL EFFECTS;

ARF LITHOGRAPHY; IMMERSION LITHOGRAPHY; PHOTOACID DIFFUSION; RESIST BLUR;

LITHOGRAPHY;

EID: 35148868242     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711420     Document Type: Conference Paper

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