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Volumn 6921, Issue , 2008, Pages
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Aberration budget in extreme ultraviolet lithography
a a a a a |
Author keywords
Aberration tolerance; EUV lithography; Mask induced aberration; Zernike sensitivity
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Indexed keywords
22 NM PATTERN;
ABERRATION TOLERANCE;
ARF LITHOGRAPHY;
MASK-INDUCED ABERRATION;
PATTERN PERIODICITY;
PATTERN SHIFTS;
ZERNIKE;
EXTREME ULTRAVIOLET LITHOGRAPHY;
SENSITIVITY ANALYSIS;
SPECIFICATIONS;
LITHOGRAPHY;
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EID: 62649166378
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.771602 Document Type: Conference Paper |
Times cited : (24)
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References (7)
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