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Volumn 6921, Issue , 2008, Pages

Aberration budget in extreme ultraviolet lithography

Author keywords

Aberration tolerance; EUV lithography; Mask induced aberration; Zernike sensitivity

Indexed keywords

22 NM PATTERN; ABERRATION TOLERANCE; ARF LITHOGRAPHY; MASK-INDUCED ABERRATION; PATTERN PERIODICITY; PATTERN SHIFTS; ZERNIKE;

EID: 62649166378     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771602     Document Type: Conference Paper
Times cited : (24)

References (7)
  • 1
    • 0030714729 scopus 로고    scopus 로고
    • Impact of lens aberrations on optical lithography
    • T. A. Brunner, "Impact of lens aberrations on optical lithography, " IBM Journal of Research and Development, Volume 41, Numbers 1/2 (1997).
    • (1997) IBM Journal of Research and Development , vol.41 , Issue.1-2
    • Brunner, T.A.1
  • 2
    • 0141832921 scopus 로고    scopus 로고
    • Evaluation of Zernike sensitivity method for CD distribution
    • T. Nakashima et al., "Evaluation of Zernike sensitivity method for CD distribution, " Proc. of SPIE Vol. 5040, pp.1600-1610 (2003).
    • (2003) Proc. of SPIE , vol.5040 , pp. 1600-1610
    • Nakashima, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.