Fabrication of nanoporous block copolymer thin films through mediation of interfacial interactions with UV cross-linked polystyrene

Macromolecules

Volumn 42, Issue 18, 2009, Pages 7213-7216

  Chen, Wei ^a   Park, Soojin ^b   Wang, Jia Yu ^c   Russell, Thomas P ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

^b Ulsan National Institute of Science and Technology   (South Korea)

^c UNIVERSITY OF CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER THIN FILMS; BROMINATED POLYSTYRENE; CATALYZED COUPLING; COPOLYMER THIN FILMS; CROSS-LINKED POLYSTYRENE; INTERFACIAL INTERACTION; LATERAL ORDERING; MASS DENSITIES; MICRO-DOMAINS; NANO-POROUS; NANOPOROUS THIN FILMS; PERPENDICULAR ORIENTATION; PMMA THIN FILM; SOLVENT ANNEALING; TWO-COMPONENT;

BLOCK COPOLYMERS; CHROMATOGRAPHIC ANALYSIS; ESTERS; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PALLADIUM; PLASTIC PRODUCTS; POLYSTYRENES; THIN FILMS;

COPOLYMERIZATION;

EID: 70349904931     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma9011413     Document Type: Article

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