Determination of the relative sputtering yield of carbon to tantalum by means of auger electron spectroscopy depth profiling

Surface and Interface Analysis

Volumn 41, Issue 10, 2009, Pages 799-803

  Kotis, L ^a   Menyhard, M ^a   Sulyok, A ^a   Safran G ^a   Zalar, A ^b   Kovac J ^b   Panjan, P ^b  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

AES depth profiling; Roughening; Sputtering yield

Indexed keywords

AES DEPTH PROFILING; ANGLE OF INCIDENCE; ANGULAR RANGE; AUGER ELECTRON SPECTROSCOPY DEPTH PROFILES; BI-LAYER; FITTING EQUATIONS; ROUGHENING; SPUTTERING YIELD; SPUTTERING YIELDS; SURFACE NORMALS; THICK LAYERS;

AUGER ELECTRON SPECTROSCOPY; AUGERS; ION BOMBARDMENT; IONS; SPUTTERING; TANTALUM;

DEPTH PROFILING;

EID: 70349808230     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3101     Document Type: Article

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