Determination of relative sputtering yield of Cr/Si

Vacuum

Volumn 82, Issue 2 SPEC. ISS., 2007, Pages 178-181

  Kotis, L ^a   Menyhard, M ^a   Toth, L ^a   Zalar, A ^b   Panjan, P ^b  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

AES depth profiling; Sputtering yield

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; RELIABILITY THEORY; SPUTTERING;

AES DEPTH PROFILING; ION ENERGY; MULTILAYER STRUCTURES; SPUTTERING YIELD;

SILICON;

EID: 35248845539     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.07.017     Document Type: Article

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