SCOPUS 정보 검색 플랫폼

Volumn 95, Issue 13, 2009, Pages

Orientation-controlled Si thin films on insulating substrates by Al-induced crystallization combined with interfacial-oxide layer modulation

(4) Kurosawa, Masashi a Kawabata, Naoyuki a Sadoh, Taizoh a Miyao, Masanobu a

a KYUSHU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL OXIDE; HIGH EFFICIENCY; HIGH QUALITY; INDUCED CRYSTALLIZATION; INSULATING SUBSTRATES; LARGE-GRAIN; LOW TEMPERATURES; OXIDE LAYER; SI FILMS; THIN-FILM SOLAR CELLS;

ALUMINUM; CRYSTALLIZATION; EPITAXIAL GROWTH; FILM GROWTH; OXIDE FILMS; PHASE TRANSITIONS; PHOTOVOLTAIC CELLS; SILICON; SOLAR CELLS; SUBSTRATES; THIN FILM DEVICES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 70349653899 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3241076 Document Type: Article

Times cited : (121)

References (15)

1
- 84959101312
- edited by J. Poortmans and V. Arkhipov (Wiley, New York), Cha,.
- G. Beaucarne and A. Slaoui, in Thin film solar cells, edited by, J. Poortmans, and, V. Arkhipov, (Wiley, New York, 2006), Chap., p. 97.
- (2006) Thin Film Solar Cells , pp. 97
- Beaucarne, G.¹ Slaoui, A.²

2
- 0030564803
- Recent progress of heterostructure technologies for novel silicon devices
- DOI 10.1016/0169-4332(96)00079-7, PII S0169433296000797
- M. Miyao, K. Nakagawa, H. Nakahara, Y. Kiyota, and M. Kondo, Appl. Surf. Sci. 0169-4332 102, 360 (1996). 10.1016/0169-4332(96)00079-7 (Pubitemid 126359108)
- (1996) Applied Surface Science , vol.102 , pp. 360-371
- Miyao, M.¹ Nakagawa, K.² Nakahara, H.³ Kiyota, Y.⁴ Kondo, M.⁵

3
- 64749097793
- 1882-0778. 10.1143/APEX.2.045503
- M. Miyao, T. Tanaka, K. Toko, and M. Tanaka, Appl. Phys. Express 1882-0778 2, 045503 (2009). 10.1143/APEX.2.045503
- (2009) Appl. Phys. Express , vol.2 , pp. 045503
- Miyao, M.¹ Tanaka, T.² Toko, K.³ Tanaka, M.⁴

4
- 67650714654
- 0003-6951. 10.1063/1.3182795
- M. Miyao, K. Toko, T. Tanaka, and T. Sadoh, Appl. Phys. Lett. 0003-6951 95, 022115 (2009). 10.1063/1.3182795
- (2009) Appl. Phys. Lett. , vol.95 , pp. 022115
- Miyao, M.¹ Toko, K.² Tanaka, T.³ Sadoh, T.⁴

5
- 0001247854
- x alloy layers
- DOI 10.1063/1.1344215
- S. Yamaguchi, N. Sugii, S. K. Park, K. Nakagawa, and M. Miyao, J. Appl. Phys. 0021-8979 89, 2091 (2001). 10.1063/1.1344215 (Pubitemid 33661977)
- (2001) Journal of Applied Physics , vol.89 , Issue.4 , pp. 2091-2095
- Yamaguchi, S.¹ Sugii, N.² Park, S.K.³ Nakagawa, K.⁴ Miyao, M.⁵

6
- 0001761088
- Aluminum-induced crystallization of amorphous silicon on glass substrates above and below the eutectic temperature
- DOI 10.1063/1.122722, PII S0003695198011486
- O. Nast, T. Puzzer, L. M. Koschier, A. B. Sproul, and S. R. Wenham, Appl. Phys. Lett. 0003-6951 73, 3214 (1998). 10.1063/1.122722 (Pubitemid 128677358)
- (1998) Applied Physics Letters , vol.73 , Issue.22 , pp. 3214-3216
- Nast, O.¹ Puzzer, T.² Koschier, L.M.³ Sproul, A.B.⁴ Wenham, S.R.⁵

7
- 0001039356
- 0021-8979. 10.1063/1.373632
- O. Nast and S. R. Wenham, J. Appl. Phys. 0021-8979 88, 124 (2000). 10.1063/1.373632
- (2000) J. Appl. Phys. , vol.88 , pp. 124
- Nast, O.¹ Wenham, S.R.²

8
- 0035199108
- Aluminium-induced crystallisation of silicon on glass for thin-film solar cells
- DOI 10.1016/S0927-0248(00)00117-3
- O. Nast, S. Brehme, S. Pritchard, T. Puzzer, A. G. Aberle, and S. R. Wenham, Sol. Energy Mater. Sol. Cells 0927-0248 65, 385 (2001). 10.1016/S0927-0248(00)00117-3 (Pubitemid 30969121)
- (2001) Solar Energy Materials and Solar Cells , vol.65 , Issue.1 , pp. 385-392
- Nast, O.¹ Brehme, S.² Pritchard, S.³ Aberle, A.G.⁴ Wenham, S.R.⁵

9
- 0036778144
- Polycrystalline Si films formed by Al-induced crystallization (AIC) with and without Al oxides at Al/a-Si interface
- DOI 10.1016/S0927-0248(02)00091-0, PII S0927024802000910
- H. Kim, D. Kim, G. Lee, D. Kim, and S. H. Lee, Sol. Energy Mater. Sol. Cells 0927-0248 74, 323 (2002). 10.1016/S0927-0248(02)00091-0 (Pubitemid 34912118)
- (2002) Solar Energy Materials and Solar Cells , vol.74 , Issue.1-4 , pp. 323-329
- Kim, H.¹ Kim, D.² Lee, G.³ Kim, D.⁴ Lee, S.H.⁵

10
- 33747438816
- Large-grained polycrystalline silicon on glass for thin-film solar cells
- DOI 10.1016/j.tsf.2005.12.067, PII S0040609005024089
- S. Gall, J. Schneider, J. Klein, K. Hübener, M. Muske, B. Rau, E. Conrad, I. Sieber, K. Petter, K. Lips, M. Stöger-Pollach, P. Schattschneider, and W. Fuhs, Thin Solid Films 0040-6090 511, 7 (2006). 10.1016/j.tsf.2005.12.067 (Pubitemid 44250835)
- (2006) Thin Solid Films , vol.511-512 , pp. 7-14
- Gall, S.¹ Schneider, J.² Klein, J.³ Hubener, K.⁴ Muske, M.⁵ Rau, B.⁶ Conrad, E.⁷ Sieber, I.⁸ Petter, K.⁹ Lips, K.¹⁰ Stoger-Pollach, M.¹¹ Schattschneider, P.¹² Fuhs, W.¹³

11
- 31644450940
- Low-temperature fabrication of polycrystalline Si thin film using Al-induced crystallization without native Al oxide at amorphous Si/Al interface
- DOI 10.1143/JJAP.44.4770
- Y. Sugimoto, N. Takata, T. Hirota, K. Ikeda, F. Yoshida, H. Nakashima, and H. Nakashima, Jpn. J. Appl. Phys., Part 1 0021-4922 44, 4770 (2005). 10.1143/JJAP.44.4770 (Pubitemid 43168006)
- (2005) Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers , vol.44 , Issue.7 A , pp. 4770-4775
- Sugimoto, Y.¹ Takata, N.² Hirota, T.³ Ikeda, K.-I.⁴ Yoshida, F.⁵ Nakashima, H.⁶ Nakashima, H.⁷

12
- 77952502968
- 0021-4922. 10.1143/JJAP.48.03B002
- M. Kurosawa, Y. Tsumura, T. Sadoh, and M. Miyao, Jpn. J. Appl. Phys. 0021-4922 48, 03B002 (2009). 10.1143/JJAP.48.03B002
- (2009) Jpn. J. Appl. Phys. , vol.48
- Kurosawa, M.¹ Tsumura, Y.² Sadoh, T.³ Miyao, M.⁴

13
- 0037109130
- Structure and morphology of aluminium-oxide films formed by thermal oxidation of aluminium
- DOI 10.1016/S0040-6090(02)00787-3, PII S0040609002007873
- L. P. H. Jeurgens, W. G. Sloof, F. D. Tichelaar, and E. J. Mittemeijer, Thin Solid Films 0040-6090 418, 89 (2002). 10.1016/S0040-6090(02)00787-3 (Pubitemid 35264333)
- (2002) Thin Solid Films , vol.418 , Issue.2 , pp. 89-101
- Jeurgens, L.P.H.¹ Sloof, W.G.² Tichelaar, F.D.³ Mittemeijer, E.J.⁴

14
- 30444447950
- A simple model explaining the preferential (1 0 0) orientation of silicon thin films made by aluminum-induced layer exchange
- DOI 10.1016/j.jcrysgro.2005.11.057, PII S0022024805013783
- J. Schneider, A. Sarikov, J. Klein, M. Muske, I. Sieber, T. Quinn, H. S. Reehal, S. Gall, and W. Fuhs, J. Cryst. Growth 0022-0248 287, 423 (2006). 10.1016/j.jcrysgro.2005.11.057 (Pubitemid 43071245)
- (2006) Journal of Crystal Growth , vol.287 , Issue.2 , pp. 423-427
- Schneider, J.¹ Sarikov, A.² Klein, J.³ Muske, M.⁴ Sieber, I.⁵ Quinn, T.⁶ Reehal, H.S.⁷ Gall, S.⁸ Fuhs, W.⁹

15
- 21544481407
- 0003-6951. 10.1063/1.99709
- K. Sawada, M. Ishida, T. Nakamura, and N. Ohtake, Appl. Phys. Lett. 0003-6951 52, 1672 (1988). 10.1063/1.99709
- (1988) Appl. Phys. Lett. , vol.52 , pp. 1672
- Sawada, K.¹ Ishida, M.² Nakamura, T.³ Ohtake, N.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.