Sputtered multicomponent amorphous dielectrics for transparent electronics

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 9, 2009, Pages 2149-2154

  Pereira, Luís ^a   Barquinha, Pedro ^a   Gonçalves, Gonçalo ^a   Vilà, Anna ^b   Olziersky, Antonis ^b   Morante, Joan ^b   Fortunato, Elvira ^a   Martins, Rodrigo ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^b UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS DIELECTRICS; BAND GAPS; CERAMIC TARGET; CODEPOSITION; COSPUTTERING; CRYSTALLINE SILICONS; DIELECTRIC COMPOSITES; DIELECTRIC CONSTANTS; ELECTRICAL CHARACTERISTIC; METAL-INSULATOR-SEMICONDUCTORS; MICROCRYSTALLINE STRUCTURES; MULTICOMPONENTS; REACTIVE GAS; ROOM TEMPERATURE; STRUCTURAL AND ELECTRICAL PROPERTIES; SUBSTRATE HEATING; TRANSPARENT ELECTRONICS;

ALUMINUM; ARGON; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; HAFNIUM COMPOUNDS; METAL INSULATOR BOUNDARIES; MIS DEVICES; OXYGEN; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES; SWITCHING CIRCUITS;

AMORPHOUS FILMS;

EID: 70349151333     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200881799     Document Type: Article

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