Influence of charged particle bombardment and sputtering parameters on the properties of HfO 2 films prepared by dc reactive magnetron sputtering

Applied Surface Science

Volumn 253, Issue 4, 2006, Pages 2143-2147

  Liu, Xin ^a   Li, Dejie ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Charged particle bombardment; Crystalline; HfO 2; Magnetron sputtering

Indexed keywords

CRYSTALLINE MATERIALS; CRYSTALLIZATION; HAFNIUM COMPOUNDS; ION BOMBARDMENT; MAGNETRON SPUTTERING; MORPHOLOGY;

MONOCLINIC PHASE; OXYGEN IONS; SPUTTERING PRESSURE; SUBSTRATE TEMPERATURE;

FILMS;

EID: 33751219223     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.04.013     Document Type: Article

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