Surface changes of solids under intense EUV irradiation using a laserplasma source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7361, Issue , 2009, Pages

  Bartnik, Andrzej ^a   Fiedorowicz, Henryk ^a   Jarocki, Roman ^a   Kostecki, Jerzy ^a   Rakowski, Rafalł ^a   Szczurek, Miroslaw ^a  

^a MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

EUV; Gas puff target; Laser plasma; Photo etching; Surface modification

Indexed keywords

EUV; GAS PUFF TARGET; LASER-PLASMA; PHOTO-ETCHING; SURFACE MODIFICATION;

ABLATION; CHEMICAL MODIFICATION; ETCHING; EXTREME ULTRAVIOLET LITHOGRAPHY; FOCUSING; IRRADIATION; KRYPTON; LASER PRODUCED PLASMAS; LASER PULSES; LASERS; MATERIALS; PLASMA INTERACTIONS; RADIATION; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; TARGETS; ULTRAVIOLET DEVICES; XENON;

SURFACES;

EID: 69949179137     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.820744     Document Type: Conference Paper

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