Kinetic Monte Carlo simulation of kinetically limited copper electrocrystallization on an atomically even surface

Electrochimica Acta

Volumn 54, Issue 27, 2009, Pages 6941-6948

  Liu, Jun ^a   Liu, Changqing ^a   Conway, Paul P ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

Copper; Electrocrystallization; Growth history; Kinetic Monte Carlo simulation; Single crystal

Indexed keywords

CLUSTER DENSITIES; CLUSTER SIZES; CONCENTRATION OF; DEPOSITION PARAMETERS; ELECTROCRYSTALLIZATION; ELECTRODE POTENTIALS; EVOLUTION OF THE MICROSTRUCTURE; GROWTH HISTORY; KINETIC MONTE CARLO; KINETIC MONTE CARLO SIMULATION; PEAK CLUSTERS; RATE OF CHANGE; SINGLE CRYSTAL COPPER;

ASPECT RATIO; CLUSTER ANALYSIS; COPPER; CRYSTAL GROWTH; ELECTROCHEMISTRY; MICROSTRUCTURE; MONOLAYERS; MONTE CARLO METHODS; RADIATION DAMAGE; SIMULATORS; TWO DIMENSIONAL;

SINGLE CRYSTALS;

EID: 69949160854     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.07.019     Document Type: Article

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