Electrochemical growth of copper single crystals in pores of polymer ion-track membranes

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 2, 1999, Pages 233-237

  Dobrev, D ^a,b   Vetter, J ^a   Angert, N ^a   Neumann, R ^a  

^a GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CLADDING (COATING); CRYSTAL GROWTH; DEPOSITION; ELECTROLYSIS; ELECTROPLATING; POLYMERIC MEMBRANES; ULTRASONIC APPLICATIONS;

DIRECT CURRENT PLATING; ELECTROCHEMICAL GROWTH; POLYMER ION TRACK MEMBRANES; SOLE REVERSIBLE ELECTROLYSIS; ULTRASONIC TREATMENT;

COPPER;

EID: 0032593251     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050995     Document Type: Article

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