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Volumn 586, Issue 2, 2006, Pages 196-203

Modelling diffusion controlled electrocrystallisation processes

Author keywords

CTT; Current transient; Current time transient; Diffusion controlled; Electrocrystallisation; Modelling

Indexed keywords

COMPUTER SIMULATION; CRYSTAL GROWTH; DIFFUSION; ELECTRODEPOSITION; ELECTRODES; IONS; MATHEMATICAL TRANSFORMATIONS;

EID: 28044436694     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2005.10.004     Document Type: Article
Times cited : (42)

References (34)
  • 34
    • 85009401966 scopus 로고    scopus 로고
    • M.Y. Abyaneh, M. Fleischmann, to be published
    • M.Y. Abyaneh, M. Fleischmann, to be published.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.