Optical quality improvement of Si photonic devices fabricated by focused-ion-beam milling

Journal of Lightwave Technology

Volumn 27, Issue 19, 2009, Pages 4306-4310

  Tian, Jie ^a   Yan, Wei ^a   Liu, Yazhao ^b   Luo, Jun ^a   Zhang, Daozhong ^b   Li, Zhiyuan ^b   Qiu, Min ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

Focused ion beam; Micro ring resonator; Photonic crystals; Silicon thermal oxidation

Indexed keywords

AMORPHOUS LAYER; CRYSTALLINE SILICONS; ETCHING MASKS; MICRO-RING RESONATOR; MILLING STRATEGIES; OPTICAL QUALITIES; OXIDATION TREATMENTS; PHOTONIC CRYSTAL CAVITIES; Q-FACTORS; REDEPOSITION; SI PHOTONICS; SILICA LAYERS; THERMAL OXIDATION PROCESS; TRANSMISSION SPECTRUMS;

AMORPHOUS SILICON; COMMINUTION; ION BEAMS; IONS; MILLING (MACHINING); OPTICAL RESONATORS; OXIDATION; SILICA; SILICON OXIDES;

PHOTONIC CRYSTALS;

EID: 69949159412     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2009.2023607     Document Type: Article

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