Sub-micron focusing of a soft x-ray free electron laser beam

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7361, Issue , 2009, Pages

  Bajt, S ^a   Chapman, H N ^b   Nelson, A J ^c   Lee, R W ^c   Toleikis, S ^a   Mirkarimi, P ^c   Alameda, J B ^c   Baker, S L ^c   Vollmer, H ^c   Graff, R T ^c   Aquila, A ^d   Gullikson, E M ^d   Ilse, J Meyer ^d   Spiller, E A ^e   Krzywinski, J ^f   Juha, L ^g   Chalupsky J ^g   Hajkova V ^g   Hajdu, J ^h   Tschentscher, T ^a  

^a DESY   (Germany)

^b UNIVERSITY OF HAMBURG   (Germany)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^e Spiller X ray Optics   (United States)

^f SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^g INSTITUTE OF MATHEMATICS   (Czech Republic)

^h UPPSALA UNIVERSITY   (Sweden)

Author keywords

Cleaning; Contamination; Free electron laser; Multilayers; Optics damage

Indexed keywords

13.5 NM; BEAM SIZE; BEST MATCH; COATED OPTICS; COATED SUBSTRATES; DENSE MATTER; DIFFRACTION LIMITED; FOCAL LENGTHS; FOCAL SPOT; INTENSITY OF THE BEAM; MIRROR REFLECTIVITY; NORMAL INCIDENCE; OPTICAL SURFACES; OPTICS DAMAGE; OXYGEN PLASMAS; SOFT X-RAY; SUBMICRON; WAVEFRONT ERRORS;

CONTAMINATION; ELECTRONS; EXPERIMENTS; FREE ELECTRON LASERS; LASERS; LIGHT; OXYGEN; ULTRAVIOLET DEVICES;

MULTILAYERS;

EID: 69949139870     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.822498     Document Type: Conference Paper

References (20)

1. V. Ayvazyan et al., "First operation of a free-electron laser generating GW power radiation at 32 nm wavelength", Eur. Phys. J. D37, 297 (2006).
2. http://hasylab.desy.de/news-events/announcements/archive/archive-of-2007/ wavelength-world-record-at-flash-65nanometers-oct-14-2007/index-eng.html
3. B. Nagler et al., "Transparency induced in solid density aluminum by ultra-intense XUV radiation", submitted to Nature Physics (2009).
4. S. Bajt, H. N. Chapman, N. Nguyen, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, S. Grantham, "Design and performance of capping layers for extreme-ultraviolet multilayer mirrors", Appl. Optics, 42, 5750-5758, (2003).
5. J. H. Underwood, and E. M. Gullikson, "High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50- 1300 eV energy region, " J. Electron Spectrosc. Relat. Phenom. 92, 265-272 (1998).
6. J. Chalupský, L. Juha, J. Kuba, V. Hájková, J. Cihelka, P. Homer, M. Kozlová, T. Mocek, J. Polan, B. Rus, J. Krzywinsky, R. Sobierajski, H. Wabnitz, J. Feldhaus, and K. Tiedtke: "Utilizing ablation of solids to characterize a focused soft x-ray laser beam, " Proc. SPIE 6586, 65860S1-65860S10 (2007).
7. J. Cihelka et al.: Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser, this Proceedings.
8. K. Boller, R. P. Haelbich, H. Hogrefe, W. Jerk, and C. Kunz, "Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation, " Nucl. Instrum. Method. 208, 273-279(1983).
9. S. Bajt, N. V. Edwards, and T. E. Madey, "Properties of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)", Surface Science Reports 63 (2007) 73-99.
10. S. Bajt, "Optics Contamination", in EUV Lithography, V. Bakshi (ed.), SPIE - The International Society for Optical Engineering, 2009.
11. A. Barty, K. A. Goldberg, "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic", Proc. SPIE 5037, 450-459 (2003).
12. D. L. Windt, "IMD: Software for modeling the optical properties of multilayer films, " Computer in Physics 12, 360 (1998). The software can be downloaded at http://cletus.phys.columbia.edu/~windt/imd/.
13. M. Malinowski, P. Grunow, C. Steinhaus, M. Clift and L. Klebanoff, "Use of molecular oxygen to reduce EUVinduced carbon contamination of optics, " Proc. SPIE 4343, 347-356 (2001).
14. M. Malinowski, C. Steinhaus, M. Clift, L. E. Klebanoff, S. Mrowka, R. Soufli, "Controlling contamination in Mo/Si multilayer mirrors by Si surface-capping modifications, " Proc. SPIE 4688, 442-453 (2002).
15. S. Graham, M. E. Malinowski, C. E. Steinhaus, P. A. Grunow, and L. E. Klebanoff, "Studies of EUV contamination mitigation", Proc. SPIE 4688, 431-441 (2002).
16. S. Graham, C. Steinhaus, M. Clift, L. E. Klebanoff, S. Bajt, "Atomic hydrogen cleaning of EUV multilayer optics, " Proc. SPIE 5037, 460-469 (2003).
17. R. E. Thomas, M. J. Mantini, R. A. Rudder, D. P. Malta, S. V. Hattangady, R. J. Markunas, "Carbon and oxygen removal from silicon (100) surfaces by remote plasma cleaning techniques, " J. Vac. Sci. Technol. A 104, 817-822 (1992).
18. 2 studied using reflection highenergy electron diffraction, " J. App. Phys. 66, 629-633 (1989).
19. V. A. Kagadei and D. I. Proskurovsky, "Use of a new type of atomic hydrogen source for cleaning and hydrogenation of compound semiconductor materials", J. Vac. Sci. Technol. A 16 2556-2561 (1998).
20. K. Hamamoto, T. Tanaka, T. Watanabe, N. Sakaya, M. Hosoya, T. Shoki, H. Hada, N. Hishinuma, H. Sugahara, H. Kinoshita, "Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation, " J. Vac. Sci. Technol.B 23, 247-252 (2005).