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Volumn 30, Issue 9, 2009, Pages 990-992

A new buried-oxide-in-drift-region trench MOSFET with improved breakdown voltage

Author keywords

Breakdown voltage (BV); Buried oxide (BOX); On resistance; Power MOSFET; Trench gate

Indexed keywords

BREAKDOWN VOLTAGE (BV); BURIED OXIDE (BOX); ON-RESISTANCE; POWER MOSFET; TRENCH GATE;

EID: 69949124386     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2009.2026918     Document Type: Article
Times cited : (11)

References (10)
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    • R. P. Zingg, "On the specific on-resistance of high-voltage and power devices," IEEE Trans. Electron Devices, vol. 51, no. 3, pp. 492-499, Mar. 2004.
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    • Zingg, R.P.1
  • 3
    • 21044453779 scopus 로고    scopus 로고
    • A concept of SOI RESURF lateral devices with striped trench electrodes
    • Jun
    • M. Kanechika, M. Kodama, T. Uesugi, and H. Tadano, "A concept of SOI RESURF lateral devices with striped trench electrodes," IEEE Trans. Electron Devices, vol. 52, no. 6, pp. 1205-1210, Jun. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.6 , pp. 1205-1210
    • Kanechika, M.1    Kodama, M.2    Uesugi, T.3    Tadano, H.4
  • 4
    • 46649114753 scopus 로고    scopus 로고
    • Double-epilayer structure for low drain voltage rating n-channel power trench MOSFET devices
    • Jul
    • M. Li, A. Crellin, I. Ho, and Q. Wang, "Double-epilayer structure for low drain voltage rating n-channel power trench MOSFET devices," IEEE Trans. Electron Devices, vol. 55, no. 7, pp. 1749-1755, Jul. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.7 , pp. 1749-1755
    • Li, M.1    Crellin, A.2    Ho, I.3    Wang, Q.4
  • 5
    • 67349218368 scopus 로고    scopus 로고
    • A stepped oxide hetero-material gate trench power MOSFET for improved performance
    • Jun
    • R. S. Saxena and M. J. Kumar, "A stepped oxide hetero-material gate trench power MOSFET for improved performance," IEEE Trans. Electron Devices, vol. 56, no. 6, pp. 1355-1359, Jun. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.6 , pp. 1355-1359
    • Saxena, R.S.1    Kumar, M.J.2
  • 6
    • 62749107900 scopus 로고    scopus 로고
    • Dual material gate technique for enhanced transconductance and breakdown voltage of trench power MOSFETs
    • Mar
    • R. S. Saxena and M. J. Kumar, "Dual material gate technique for enhanced transconductance and breakdown voltage of trench power MOSFETs," IEEE Trans. Electron Devices, vol. 56, no. 3, pp. 517-522, Mar. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.3 , pp. 517-522
    • Saxena, R.S.1    Kumar, M.J.2
  • 7
    • 56549101376 scopus 로고    scopus 로고
    • A new strained-silicon channel trenchgate power MOSFET: Design and analysis
    • Nov
    • R. S. Saxena and M. J. Kumar, "A new strained-silicon channel trenchgate power MOSFET: Design and analysis," IEEE Trans. Electron Devices, vol. 55, no. 11, pp. 3229-3304, Nov. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.11 , pp. 3229-3304
    • Saxena, R.S.1    Kumar, M.J.2
  • 10
    • 85008010099 scopus 로고    scopus 로고
    • Effects of oxide-fixed charge on the breakdown voltage of superjunction devices
    • Mar
    • S. Balaji and S. Karmalkar, "Effects of oxide-fixed charge on the breakdown voltage of superjunction devices," IEEE Electron Device Lett., vol. 28, no. 3, pp. 229-231, Mar. 2007.
    • (2007) IEEE Electron Device Lett , vol.28 , Issue.3 , pp. 229-231
    • Balaji, S.1    Karmalkar, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.