Vector Hopkins model research based on off-axis illumination in nanoscale lithography

Progress in Electromagnetics Research

Volumn 93, Issue , 2009, Pages 291-306

  Cao, P F ^a   Cheng, L ^a   Zhang, X P ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADAPTIVE OPTICS; ELECTRIC FIELDS; LITHOGRAPHY; PHOTOLITHOGRAPHY; PHOTORESISTS;

DIFFUSION PARAMETERS; ELECTROMAGNETIC THEORIES; LITHOGRAPHY PROCESS; NANOSCALE LITHOGRAPHY; OBLIQUE INCIDENCE; OFF AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTIONS; TRANSMISSION CROSS COEFFICIENT;

VECTORS;

EID: 69849113089     PISSN: 10704698     EISSN: 15598985     Source Type: Journal    
DOI: 10.2528/PIER09031702     Document Type: Article

References (26)

1. Inazuki, Y. C., "Analysis of diffraction orders including mask topography effects for OPC optimization," Proc. of SPIE on Optical Microlithography XX, Vol. 6520, 65204S, San Jose, CA, USA, 2007.
2. Pistor, T. V., A. R. Neureuther, and R. J. Socha, "Modeling oblique incidence effects in phoromasks," Proc. of SPIE on Optical Microlithography XIII, Vol. 4000, 228, Santa Clara, CA, USA, 2000.
3. Born, M. and E. Wolf, Principles of Optics, Pergamon Press, 1980.
4. Saied, M., F. Foussadier, and J. Belledent, "3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm mode," Proc. of SPIE on Photomask Technology, Vol. 6730, Monterey, CA, USA, 2007.
5. Liu, P., Y. Cao, and L. Chen, "Fast and accurate 3D mask model for full-chip OPC and verification," Proc. of SPIE on Optical Microlithography XX, Vol. 6520, San Jose, CA, USA, 2007.
6. Inui, H. and T. Ohta, "A practical 3D lithography simulation system," SPIE, Vol. 3051, 522-528, 1997.
7. Stratton, J., Electromagnetic Theory, McGraw-Hill Book Company, 1941.
8. Guo, L., Y. Wang, R. Wang, and Z.-S. Wu, "Investigation on the electromagnetic scattering of plane wave/Gaussian beam by adjacent multi-particles," Progress In Electromagnetics Research B, Vol. 14, 219-245, 2009.
9. Giampaolo, Di, E. and F. Bardati, "A projective approach to electromagnetic propagation in complex environments," Progress In Electromagnetics Research B, Vol. 13, 357, 2009.
10. Ayub, M., A. B. Mann, M. Ramzan, and M. H. Tiwana, "Diffraction of plane waves by a slit in an infinite soft-hard plane," Progress In Electromagnetics Research B, Vol. 11, 103-131, 2009.
11. Molinet, F. A., "Plane wave diffraction by a strongly elongated object illuminated in the paraxial diretion," Progress In Electromagnetics Research B, Vol. 6, 135-151, 2008.
12. Yuan, C. M., "Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography," J. Opt. Soc. Amer., Vol. 8, 778, 1991.
13. Rahim, T., M. J. Mughal, Q. A. Naqvi, and M. Faryad, "Field around the focal region of a paraboloidal reflector placed in isotropic chiral medium," Progress In Electromagnetics Research B, Vol. 15, 57-76, 2009.
14. Yeung, M. S. and D. Lee, "Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects," Proc. of SPIE on Optical/Laser Microlithography, Vol. 1927, 452-463, San Jose, CA, USA, 1993.
15. McCartin, B. J., L. J. Bahrmasel, and G. Meltz, "Application of the control region approximation to two-dimensional electromagnetic scattering," Progress In Electromagnetics Research, PIER 02, 175-21, 1990.
16. Yeung, M. S., "Modelling high numerical aperture optical lithography," Proc. SPIE, Vol. 922, 149-167, 1988.
17. Wolf, E., "Electromagnetic diffraction in optical system I. An integral representation of the image field," Proc. Roc. Soc. A, Vol. 253, 349-357, 1959.
18. Hatamzadeh-Varmazyar, S. and M. Naser-Moghadasi, "An integral equation modeling of electromagnetic scattering from the surfaces of arbitrary resistance distribution," Progress In Electromagnetics Research B, Vol. 3, 157-172, 2008.
19. Cornsweet, T. N. and J. I. Yellott, "Intensity dependent spatial summation," Journal of Optical Society of America A, Vol. 2, No. 10, 1769-1786, 1985.
20. Golub, G. H. and C. F. Van Loan, Matrix Computations, JHU Press, 1996.
21. 2) algorithm for the symmetric tri-diagonal eigenvalue/eigenvector problem," University of California Report, Berkeley, 1997.
22. Holland, J. H., Adaptation in Nature and Artificial Systems, The University of Michigan Press, 1975.
23. Raymer, M. L. and W. F. Punch, "Dimensionality reduction using genetic algorithms," IEEE Transactions on Evolutionary Computation, Vol. 4, 164-171, 2000.
24. Bruge, S., "Rigorous simulation of 3D masks," Proc. SPIE on 26th Annual BACUS Symposium on Photomask Technology, Monterey, Vol. 6349, CA, USA, 2006.
25. Wang, Y. J., W. J. Koh, and C. K. Lee, "Electromagnetic coupling analysis of transient signal through slots or apertures perforated in a shielding metallic enclosure using FDTD methodology," Progress In Electromagnetics Research, PIER 36, 247-264, 2002.
26. Bruge, S., "Benchmark of FEM, waveguide and FDTD algorithms for rigorous mask simulation," Proc. SPIE on 25th Annual BACUS Symposium on Photomask Technology, Monterey, Vol. 5992, CA, USA, 2005.