Rigorous Simulation of 3D Masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Burger, Sven ^a,b,c   Köhle, Roderick ^d   Zschiedrich, Lin ^a,b,c   Nguyen, Hoa ^d   Schmidt, Frank ^a,b,c   März, Reinhard ^b,e   Nölscher, Christoph ^d  

^a ZUSE INSTITUTE BERLIN   (Germany)

^b Deutsche Forschungsgemeinschaft   (Germany)

^c JCMWAVE GMBH   (Germany)

^d QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^e INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

FEM; Finite element method; Microlithography; Photomask; Simulation

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; FINITE ELEMENT METHOD; IMAGING SYSTEMS; LIGHT PROPAGATION; PHOTOLITHOGRAPHY; POLARIZATION;

3D LITHOGRAPHY SIMULATIONS; AERIAL IMAGING; COMPUTATIONAL DOMAIN; POLARIZATION DIRECTIONS;

MASKS;

EID: 33846623371     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.687816     Document Type: Conference Paper

References (16)

1. A. Erdmann, "Process optimization using lithography simulation," Proc. SPIE 5401, p. 22, 2004.
2. S. Burger, R. Köhle, L. Zschiedrich, W. Gao, F. Schmidt, R. März, and C. Nölscher, "Benchmark of FEM, waveguide and FDTD algorithms for rigorous mask simulation," in Photomask Technology, J. T. Weed and P. M. Martin, eds., 5992, pp. 378-389, Proc. SPIE, 2005.
3. C. Enkrich, M. Wegener, S. Linden, S. Burger, L. Zschiedrich, F. Schmidt, C. Zhou, T. Koschny, and C. M. Soukoulis, "Magnetic metamaterials at telecommunication and visible frequencies," Phys. Rev. Lett. 95, p. 203901, 2005.
4. S. Burger, L. Zschiedrich, R. Klose, A. Schädle, F. Schmidt, C. Enkrich, S. Linden, M. Wegener, and C. M. Soukoulis, "Numerical investigation of light scattering off split-ring resonators," in Metamaterials, T. Szoplik, E. Özbay, C. M. Soukoulis, and N. I. Zheludev, eds., 5955, pp. 18-26, Proc. SPIE, 2005.
5. S. Burger, R. Klose, A. Schädle, and F. S. and L. Zschiedrich, "FEM modelling of 3d photonic crystals and photonic crystal waveguides," in Integrated Optics: Devices, Materials, and Technologies IX, Y. Sidorin and C. A. Wächter, eds., 5728, pp. 164-173, Proc. SPIE, 2005.
6. T. Kalkbrenner, U. Hakanson, A. Schädle, S. Burger, C. Henkel, and V. Sandoghdar, "Optical microscopy using the spectral modifications of a nano-antenna," Phys. Rev. Lett. 95, p. 200801, 2005.
7. L. Zschiedrich, R. Klose, A. Schädle, and F. Schmidt, "A new finite element, realization of the Perfectly Matched Layer Method for Helmholtz scattering problems on polygonal domains in 2D," J. Comput. Appl. Math. 188, pp. 12-32, 2006.
8. T. Hohage, F. Schmidt, and L. Zschiedrich, "Solving Time-Harmonic Scattering Problems Based on the Pole Condition I: Theory,'' SIAM J. Math. Anal. 35(1), pp. 183-210, 2003.
9. K. Sakoda, Optical Properties of Photonic Crystals, Springer-Verlag, Berlin, 2001.
10. P. Monk, Finite Element Methods for Maxwell's Equations, Claredon Press, Oxford, 2003.
11. L. Zschiedrich, S. Burger, R. Klose, A. Schädle, and F. Schmidt, "JCMmode: an adaptive finite element solver for the computation of leaky modes," in Integrated Optics: Devices, Materials, and Technologies IX, Y. Sidorin and C. A. Wächter, eds., 5728, pp. 192-202, Proc. SPIE, 2005.
12. O. Schenk et al., "Parallel sparse direct linear solver PARDISO." Department of Computer Science, Universität Basel.
13. P. Deuflhard, F. Schmidt, T. Friese, and L. Zschiedrich, Adaptive Multigrid Methods for the Vectorial Maxwell Eigenvalue Problem for Optical Waveguide Design, pp. 279-293. Mathematics - Key Technology for the Future, Springer-Verlag, Berlin, 2003.
14. L. Zschiedrich, S. Burger, A. Schädle, and F. Schmidt, "Domain decomposition method for electromagnetic scattering problems," in Proceedings of the 5th International Conference on Numerical Simulation of Optoelectronic devices, pp. 55-56, 2005.
15. A. Schädle, L. Zschiedrich, S. Burger, R. Klose, and F. Schmidt, "Domain decomposition method for Maxwells equations: Scattering off periodic structures," Tech. Rep. 06-04, Zuse-Institute Berlin, 2006.
16. J. Pomplun, S. Burger, F. Schmidt, L. W. Zschiedrich, F. Scholze, and U. Dersch, "Rigorous FEM-simulation of EUV-masks: Influence of shape and material parameters," in Photomask Technology, Proc. SPIE 6349-128, 2006.