Practical 3D lithography simulation system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 522-528

  Inui, Hirotomo ^a   Kaneko, Hirokatsu ^a   Tounai, Keiichiro ^a   Tanabe, Kiroyoshi ^a   Ohta, Toshiyuki ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AERIAL PHOTOGRAPHY; ALGORITHMS; COMPUTER SIMULATION; FAST FOURIER TRANSFORMS; IMAGE PROCESSING; OBJECT ORIENTED PROGRAMMING; OPTIMIZATION;

3D LITHOGRAPHY; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031357572     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276031     Document Type: Conference Paper

References (5)