Benchmark of FEM, waveguide and FDTD algorithms for rigorous mask simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Burger, Sven ^a,b,c   Köhle, Roderick ^d   Zschiedrich, Lin ^a,b,c   Gao, Weimin ^e   Schmidt, Frank ^a,b,c   März, Reinhard ^c,d   Nölscher, Christoph ^d  

^a ZUSE INSTITUTE BERLIN   (Germany)

^b Deutsche Forschungsgemeinschaft   (Germany)

^c JCMWAVE GMBH   (Germany)

^d INFINEON TECHNOLOGIES AG   (Germany)

^e Sigma C Software AG   (Germany)

Author keywords

FDTD; FEM; Phase shift mask; Photolithography; Photomask simulation benchmark

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFERENTIATION (CALCULUS); FINITE ELEMENT METHOD; OPTICAL WAVEGUIDES;

FDTD; PHASE SHIFT MASK; PHOTOMASK SIMULATION BENCHMARK; TRANSMISSION ANALYSIS;

MASKS;

EID: 33644608589     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.631696     Document Type: Conference Paper

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