Two-dimensional dopant profiling with low-energy SEM

Journal of Microscopy

Volumn 230, Issue 1, 2008, Pages 76-83

  Mika, F ^a   Frank, L ^a  

^a INSTITUTE OF SCIENTIFIC INSTRUMENTS   (Czech Republic)

Author keywords

Dopant contrast; Low energy SEM; Semiconductors

Indexed keywords

SECONDARY EMISSION; SEMICONDUCTOR DOPING;

DOPANT CONCENTRATIONS; DOPANT CONTRAST; DOPANT PROFILING; IMAGE CONTRASTS; LOW ENERGY SEM; LOWER ENERGIES; QUANTITATIVE RELATIONS; SCANNING ELECTRONS; SECONDARY ELECTRON EMISSIONS; TWO-DIMENSIONAL;

SCANNING ELECTRON MICROSCOPY;

DOPANT; ELEMENT; UNCLASSIFIED DRUG;

ARTICLE; CONTRAST; IMAGING; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR;

EID: 41749102403     PISSN: 00222720     EISSN: 13652818     Source Type: Journal    
DOI: 10.1111/j.1365-2818.2008.01957.x     Document Type: Article

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