Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 77-83

  Krause, Matthias ^a   Bedel, Laurent ^b   Taupeau, Anthony ^b   Kreissig, Ulrich ^a   Munnik, Frans ^a   Abrasonis, Gintautas ^a   Kolitsch, Andreas ^a   Radnoczi, György ^c   Czigány, Zsolt ^c   Vanhulsel, Annick ^d  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b CEA GRENOBLE   (France)

^c INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^d FLEMISH INSTITUTE FOR TECHNOLOGICAL RESEARCH VITO   (Belgium)

Author keywords

BCxNy; Hard coatings; Magnetron sputtering; Mechanical properties; Spectroscopy; Structural properties; Thin films

Indexed keywords

BCXNY; CONCENTRATION RANGES; DOMINANT PROCESS; ELASTIC RECOIL DETECTION ANALYSIS; ELASTIC RECOVERY; FOURIER TRANSFORM INFRARED; HEXAGONAL BORON NITRIDE; NANOCRYSTALLINES; REACTIVE MAGNETRON SPUTTERING; STOICHIOMETRIC RATIO; STRUCTURAL AND MECHANICAL CHARACTERIZATIONS; STRUCTURAL DETAILS;

BORON; BORON NITRIDE; FILM GROWTH; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; NITRIDES; PHOTOELECTRON SPECTROSCOPY; PLASMAS; STRUCTURAL PROPERTIES; THIN FILMS;

HARD COATINGS;

EID: 69749116167     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.030     Document Type: Article

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