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Review of Scientific Instruments

Volumn 80, Issue 8, 2009, Pages

High-resolution laser lithography system based on two-dimensional acousto-optic deflection

(3) Koechlin, Manuel a Poberaj, Gorazd a Günter, Peter a

a ETH ZURICH (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTO-OPTICS; ACOUSTOOPTICAL DEFLECTORS; ADJACENT STRUCTURES; COMPACT LASERS; CONTINUOUS-WAVE DIODE LASER; FAST PROTOTYPING; FOCAL LENGTHS; HIGH RESOLUTION; INTEGRATED OPTICS DEVICES; LASER BEAM STEERING; LASER LITHOGRAPHY; LINEAR STAGES; MICRORING RESONATOR; MICROSCOPE OBJECTIVE; NUMERICAL APERTURE; PHOTORESIST MASK; PHOTORESIST PATTERNS; STEP LITHOGRAPHY; STRUCTURE WIDTH;

ACOUSTOOPTICAL EFFECTS; LITHOGRAPHY; OPTICAL RESONATORS; PHOTONIC CRYSTALS; PHOTONICS; PHOTORESISTORS; PHOTORESISTS; SURFACE TREATMENT; TWO DIMENSIONAL;

LASER RESONATORS;

EID: 69749108442 PISSN: 00346748 EISSN: None Source Type: Journal
DOI: 10.1063/1.3202274 Document Type: Article

Times cited : (21)

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