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Volumn 41, Issue 5, 2002, Pages 895-901

Model of linewidth for laser writing on a photoresist

Author keywords

[No Author keywords available]

Indexed keywords

BESSEL FUNCTIONS; EXTRAPOLATION; LASER APPLICATIONS; LASER BEAMS; LASER TUNING; MATHEMATICAL MODELS;

EID: 0036307547     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.000895     Document Type: Article
Times cited : (13)

References (22)
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  • 6
    • 0000690236 scopus 로고
    • Laser patterning system for integrated optics and storage applications
    • M. G. Lad, G. M. Naik, and A. Selvarajan, “Laser patterning system for integrated optics and storage applications, ” Opt. Eng. 32, 725-729 (1993).
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  • 7
    • 0009694548 scopus 로고    scopus 로고
    • System for laser writing to lithograph masks for integrated optics
    • J. R. Salgueiro, J. F. Romain, and V. Moreno, “System for laser writing to lithograph masks for integrated optics, ” Opt. Eng. 37, 1115-1123 (1998).
    • (1998) Opt. Eng. , vol.37 , pp. 1115-1123
    • Salgueiro, J.R.1    Romain, J.F.2    Moreno, V.3
  • 8
    • 0001570505 scopus 로고
    • Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists
    • M. T. Gale, M. Rossi, J. Pedersen, and H. Shutz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists, ” Opt. Eng. 33, 3556-3566 (1994).
    • (1994) Opt. Eng. , vol.33 , pp. 3556-3566
    • Gale, M.T.1    Rossi, M.2    Pedersen, J.3    Shutz, H.4
  • 10
    • 0000366046 scopus 로고
    • Synthetic holograms written by a laser pattern generator
    • U. Krackhardt, J. Schwider, M. Schrader, and N. Streibl, “Synthetic holograms written by a laser pattern generator, ” Opt. Eng. 32, 781-785 (1993).
    • (1993) Opt. Eng. , vol.32 , pp. 781-785
    • Krackhardt, U.1    Schwider, J.2    Schrader, M.3    Streibl, N.4
  • 11
    • 0031233084 scopus 로고    scopus 로고
    • Low-cost direct writing lithography system for the sub-micron range
    • H. Becker, R. Caspary, C. Toepfer, M. V. Schickfus, and S. Hunklinger, “Low-cost direct writing lithography system for the sub-micron range, ” J. Mod. Opt. 44, 1715-1723 (1997).
    • (1997) J. Mod. Opt. , vol.44 , pp. 1715-1723
    • Becker, H.1    Caspary, R.2    Toepfer, C.3    Schickfus, M.V.4    Hunklinger, S.5
  • 12
    • 0025683587 scopus 로고
    • Resolution performance of a 0.60 NA, 364 nm laser direct writer
    • V. Pol, ed., Proc. SPIE
    • P. C. Allen and P. Buck, “Resolution performance of a 0.60 NA, 364 nm laser direct writer, ” in Optical/Laser Microlithography III, ” V. Pol, ed., Proc. SPIE 1264, 454-465 (1990).
    • (1990) Optical/Laser Microlithography III , vol.1264 , pp. 454-465
    • Allen, P.C.1    Buck, P.2
  • 13
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    • Maskenschreiben mit Laser
    • (Springer-VDI-Verlag, Dusseldorf, Germany) Berichte
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    • Maurer, W.1
  • 15
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  • 19
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    • Mack, C.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.