Development and applications of a laser writing lithography system for maskless patterning

Optical Engineering

Volumn 37, Issue 9, 1998, Pages 2521-2530

  Chan, Yuen Chuen ^a,b,c   Lam, Yee Loy ^a,d,e,f,g   Zhou, Yan ^a,h   Xu, Feng Lan ^a,i,j,k   Liaw, Chin Yi ^a,l   Jiang, Wei ^a   Ahn, Jaeshin ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF TOKYO   (Japan)

^c JAPAN SOCIETY OF APPLIED PHYSICS   (Japan)

^d NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^e UNIVERSITY OF MICHIGAN   (United States)

^f Rank O'Connor's (S) Pte Ltd   (Australia)

^g Photonics Research Group

^h UNIVERSITY OF GLASGOW   (United Kingdom)

ⁱ NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^j JILIN UNIVERSITY   (China)

^k CHANGCHUN INSTITUTE OF OPTICS   (China)

^l NTU

more..

Author keywords

Diamond thin films; Laser ablation; Laser writing; Lithography; Polythiophene film; Ultraviolet laser

Indexed keywords

EID: 0000704207     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.601760     Document Type: Article

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