Laser lithography on resist bi-layer for nanoelectromechanical systems prototyping

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 491-495

  Forsen E ^a   Carlberg, P ^b   Montelius, L ^b   Boisen, A ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b LUND UNIVERSITY   (Sweden)

Author keywords

Direct write; Laser lithography; Nanoeletromechanical systems; Rapid prototyping; Resist bi layer

Indexed keywords

ACETONE; DISSOLUTION; LASER APPLICATIONS; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; PHOTORESISTS; POLYMETHYL METHACRYLATES; RAPID PROTOTYPING; SOLVENTS;

DIRECT WRITE; LASER LITHOGRAPHY; NANOELECTROMECHANICAL SYSTEMS; RESIST BI-LAYERS;

MICROELECTRONICS;

EID: 2542493502     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00199-6     Document Type: Conference Paper

References (7)

1. Boisen A., Birkelund K., Hansen O., Grey F. J. Vac. Sci. Technol. B. 16:1998;2977-2981.
2. Müllenborn M., Dirac H., Petersen J.W. Appl. Surf. Sci. 86:1995;568-576.
3. Wanke M.C., Lehmann O., Müller K., Wen Q., Stuke M. Science. 275:1997;1284-1286.
4. Heidelberg Instruments Mikrotechnik GmbH, Tullastrae 2, 69126 Heidelberg, Germany.
5. Sekaric L., Parpia J.M., Feygelson T., Craighead H.G., Houston B.H., Butler J.E. Appl. Phys. Lett. 81(23):2002;4455-4457.
6. P.F. Chong, B.J. Cho, E.F. Chor, M.S. Joo, Proc. 8th IPFA 2001 (2001) 55-58.
7. Z.J. Davis, G. Abadal, E. Forsén, O. Hansen, F. Campabadal, E. Figueras, J. Esteve, J. Verd, F. Pérez-Murano, X. Borrisé, S.G. Nilsson, I. Maximov, L. Montelius, N. Barniol, A. Boisen, Proc. Trancducers 2003 (2003) 496-499.