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Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 419-425

Stability and degradation of plasma deposited boron nitride thin films in ambient atmosphere

(4) Anutgan, Tamila Aliyeva a Anutgan, Mustafa a Atilgan, Ismail a Katircioglu, Bayram a

a MIDDLE EAST TECHNICAL UNIVERSITY (Turkey)

Author keywords

Boron nitride; Fourier transform infrared spectroscopy; Moisture; Tauc slope; UV visible spectroscopy

Indexed keywords

AIR EXPOSURE; AMBIENT AIR CONDITIONS; AMBIENT ATMOSPHERE; AMMONIUM BORATES; BN FILMS; BORON NITRIDE THIN FILMS; DEPOSITION PARAMETERS; DIBORANE; FOURIER TRANSFORM INFRARED; HIGHER T; LOW POWER RADIOS; MICRO CRYSTALLITE; PEAK AREA RATIOS; SOURCE GAS; STRUCTURAL ORDERS; SUBSTRATE TEMPERATURE; TAUC SLOPE; UV-VISIBLE SPECTROSCOPY;

AMMONIUM COMPOUNDS; BORON; CRYSTALLITES; DEGRADATION; DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GRAFTING (CHEMICAL); HYDROGEN; INFRARED SPECTROPHOTOMETERS; MOISTURE; MOLECULAR BEAM EPITAXY; NITRIDES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA STABILITY; PLASMAS; RADIO BROADCASTING; SPECTROSCOPIC ANALYSIS; SYNTHESIS (CHEMICAL); THIN FILMS; ULTRAVIOLET SPECTROSCOPY;

BORON NITRIDE;

EID: 69549112974 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.06.043 Document Type: Article

Times cited : (7)

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