Substrate and annealing effects on the pulsed-laser deposited TiO 2 thin films

Journal of Optoelectronics and Advanced Materials

Volumn 5, Issue 4, 2003, Pages 841-847

  Hsu, L S ^a   Luca, D ^a,b  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

^b ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

Anatase TiO2 thin films; Contact angle; Optical transmittance; Pulsed laser deposition; Raman shift

Indexed keywords

ANNEALING; COMPOSITION; CONTACT ANGLE; MORPHOLOGY; OPACITY; OPTIMIZATION; OXIDATION; PHASE TRANSITIONS; REFRACTIVE INDEX; SINGLE CRYSTALS; SPECTROPHOTOMETRY; THERMODYNAMICS; TITANIUM DIOXIDE;

GAS PRESSURE; RAMAN SHIFT; WETTABILITY;

THIN FILMS;

EID: 0346334361     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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