Growth of epitaxial monolayers

Surface Science

Volumn 357-358, Issue , 1996, Pages 809-819

  Henzler, M ^a  

^a Leibniz University Hannover   (Germany)

Author keywords

Alkali halides; Crystallization; Epitaxy; Faceting; Germanium; Growth; Insulating films; Insulating surfaces; Low index single crystal surfaces; Metal semiconductor nonmagnetic thin film structures; Metallic films; Molecular beam epitaxy; Nucleation

Indexed keywords

CRYSTALLIZATION; LOW ENERGY ELECTRON DIFFRACTION; METALLIC FILMS; MOLECULAR BEAM EPITAXY; MONOLAYERS; NUCLEATION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILVER; THIN FILMS;

ALKALI HALIDES; FACETING; INSULATING FILMS; INSULATING SURFACES; ISLAND DENSITY; LOW INDEX SINGLE CRYSTAL SURFACES; METAL SEMICONDUCTOR NONMAGNETIC THIN FILM STRUCTURES; SINGLE CRYSTAL EPITAXY; SPOT PROFILE ANALYSIS; SURFACE TOPOGRAPHY;

EPITAXIAL GROWTH;

EID: 0030169476     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00270-1     Document Type: Article

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