The electrical property of plasma-treated Ta/TaNx diffusion barrier

Journal of Physics and Chemistry of Solids

Volumn 69, Issue 2-3, 2008, Pages 601-604

  Wang, Yu Sheng ^a   Lee, Wen Hsi ^a   Wang, Ying Lang ^b,c   Hung, Chi Cheng ^a   Chang, Shih Chieh ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

^c NATIONAL CHIAYI UNIVERSITY   (Taiwan)

Author keywords

A. Multilayers; A. Semiconductors; A. Thin films; D. Electrical properties

Indexed keywords

COPPER; ELECTRIC PROPERTIES; MULTILAYERS; SPUTTERING; TANTALUM COMPOUNDS;

CHEMICAL INERTNESS; DIELECTRIC LAYERS;

DIFFUSION BARRIERS;

EID: 38749125504     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2007.07.048     Document Type: Article

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