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Applied Physics Letters

Volumn 95, Issue 7, 2009, Pages

Tailoring UV cure depth profiles for optimal mechanical properties of organosilicate thin films

(4) Kim, Taek Soo a Chumakov, Dmytro b Zschech, Ehrenfried b Dauskardt, Reinhold H a

a Stanford University (United States)

b GLOBALFOUNDRIES (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COHESIVE PROPERTY; DEPTH PROFILE; INTERFACIAL FRACTURE ENERGY; ORGANOSILICATE FILMS; ORGANOSILICATE THIN FILMS; SPACER LAYER; STANDING WAVE; UNDERLYING LAYERS; UV CURE; UV INTENSITY; UV-CURING;

CURING; FRACTURE ENERGY; INTERFACIAL ENERGY; LIGHT TRANSMISSION; OPTICAL PROPERTIES; SILICON NITRIDE; THIN FILMS;

MECHANICAL PROPERTIES;

EID: 69249191580 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3190198 Document Type: Article

Times cited : (8)

References (23)

1
- 69249192522
- (IEEE, Piscataway, NJ)
- A. Grill, Proceedings of the IEEE International Interconnect Technology Conference (IEEE, Piscataway, NJ, 2008), p. 28.
- (2008) Proceedings of the IEEE International Interconnect Technology Conference , pp. 28
- Grill, A.¹

2
- 0344822645
- 1433-7851, 10.1002/(SICI)1521-3773(19991115)38:22<3268::AID-ANIE32683. 0.CO;2-U
- A. K. Cheetham, G. Ferey, and T. Loiseau, Angew. Chem., Int. Ed. 1433-7851 38, 3268 (1999). 10.1002/(SICI)1521-3773(19991115)38:22<3268::AID- ANIE32683.0.CO;2-U
- (1999) Angew. Chem., Int. Ed. , vol.38 , pp. 3268
- Cheetham, A.K.¹ Ferey, G.² Loiseau, T.³

3
- 0034324763
- 0956-5663, 10.1016/S0956-5663(00)00088-9
- T. A. Desai, D. J. Hansford, L. Leoni, M. Essenpreis, and M. Ferrari, Biosens. Bioelectron. 0956-5663 15, 453 (2000). 10.1016/S0956-5663(00)00088-9
- (2000) Biosens. Bioelectron. , vol.15 , pp. 453
- Desai, T.A.¹ Hansford, D.J.² Leoni, L.³ Essenpreis, M.⁴ Ferrari, M.⁵

4
- 0036927604
- 0959-9428, 10.1039/b207390k
- W. -C. Chen, L. -H. Lee, B. -F. Chen, and C. -T. Yen, J. Mater. Chem. 0959-9428 12, 3644 (2002). 10.1039/b207390k
- (2002) J. Mater. Chem. , vol.12 , pp. 3644
- Chen, W.-C.¹ Lee, L.-H.² Chen, B.-F.³ Yen, C.-T.⁴

5
- 34250628040
- Thermally stable antireflective coatings based on nanoporous organosilicate thin films
- DOI 10.1021/la070003q
- S. Kim, J. Cho, and K. Char, Langmuir 0743-7463 23, 6737 (2007). 10.1021/la070003q (Pubitemid 46943503)
- (2007) Langmuir , vol.23 , Issue.12 , pp. 6737-6743
- Kim, S.¹ Cho, J.² Char, K.³

6
- 0346686074
- 1476-1122, 10.1038/nmat1037
- E. P. Guyer and R. H. Dauskardt, Nature Mater. 1476-1122 3, 53 (2004). 10.1038/nmat1037
- (2004) Nature Mater. , vol.3 , pp. 53
- Guyer, E.P.¹ Dauskardt, R.H.²

7
- 29044435187
- 0884-2914, 10.1557/JMR.2005.0079
- E. P. Guyer and R. H. Dauskardt, J. Mater. Res. 0884-2914 20, 680 (2005). 10.1557/JMR.2005.0079
- (2005) J. Mater. Res. , vol.20 , pp. 680
- Guyer, E.P.¹ Dauskardt, R.H.²

8
- 33744501237
- Fracture of nanoporous methyl silsesquioxane thin-film glasses
- DOI 10.1557/jmr.2006.0106
- E. P. Guyer, M. Patz, and R. H. Dauskardt, J. Mater. Res. 0884-2914 21, 882 (2006). 10.1557/jmr.2006.0106 (Pubitemid 43805176)
- (2006) Journal of Materials Research , vol.21 , Issue.4 , pp. 882-894
- Guyer, E.P.¹ Patz, M.² Dauskardt, R.H.³

9
- 41549102521
- 0021-8979, 10.1063/1.2894727
- T. Kim, N. Tsuji, N. Kemeling, K. Matsushita, D. Chumakov, H. Geisler, E. Zschech, and R. H. Dauskardt, J. Appl. Phys. 0021-8979 103, 064108 (2008). 10.1063/1.2894727
- (2008) J. Appl. Phys. , vol.103 , pp. 064108
- Kim, T.¹ Tsuji, N.² Kemeling, N.³ Matsushita, K.⁴ Chumakov, D.⁵ Geisler, H.⁶ Zschech, E.⁷ Dauskardt, R.H.⁸

10
- 54049084560
- 0021-8979, 10.1063/1.2999637
- T. Kim, N. Tsuji, K. Matsushita, N. Kobayashi, D. Chumakov, H. Geisler, E. Zschech, and R. H. Dauskardt, J. Appl. Phys. 0021-8979 104, 074113 (2008). 10.1063/1.2999637
- (2008) J. Appl. Phys. , vol.104 , pp. 074113
- Kim, T.¹ Tsuji, N.² Matsushita, K.³ Kobayashi, N.⁴ Chumakov, D.⁵ Geisler, H.⁶ Zschech, E.⁷ Dauskardt, R.H.⁸

11
- 50849122022
- 0021-8979, 10.1063/1.2968438
- D. M. Gage, J. F. Stebbins, L. Peng, Z. Cui, A. Al-Bayati, K. P. MacWilliams, H. M'Saad, and R. H. Dauskardt, J. Appl. Phys. 0021-8979 104, 043513 (2008). 10.1063/1.2968438
- (2008) J. Appl. Phys. , vol.104 , pp. 043513
- Gage, D.M.¹ Stebbins, J.F.² Peng, L.³ Cui, Z.⁴ Al-Bayati, A.⁵ MacWilliams, K.P.⁶ M'Saad, H.⁷ Dauskardt, R.H.⁸

12
- 51449115467
- 1359-6454, 10.1016/j.actamat.2008.06.007
- Y. Lin, Y. Xiang, T. Y. Tsui, and J. J. Vlassak, Acta Mater. 1359-6454 56, 4932 (2008). 10.1016/j.actamat.2008.06.007
- (2008) Acta Mater. , vol.56 , pp. 4932
- Lin, Y.¹ Xiang, Y.² Tsui, T.Y.³ Vlassak, J.J.⁴

13
- 33645229819
- 0021-8979, 10.1063/1.2178393
- F. Iacopi, Y. Travaly, B. Eyckens, C. Waldfried, T. Abell, E. P. Guyer, D. M. Gage, R. H. Dauskardt, T. Sajavaara, K. Houthoofd, P. Grobet, P. Jacobs, and K. Maex, J. Appl. Phys. 0021-8979 99, 053511 (2006). 10.1063/1.2178393
- (2006) J. Appl. Phys. , vol.99 , pp. 053511
- Iacopi, F.¹ Travaly, Y.² Eyckens, B.³ Waldfried, C.⁴ Abell, T.⁵ Guyer, E.P.⁶ Gage, D.M.⁷ Dauskardt, R.H.⁸ Sajavaara, T.⁹ Houthoofd, K.¹⁰ Grobet, P.¹¹ Jacobs, P.¹² Maex, K.¹³

14
- 55349085080
- (Materials Research Society, Warrendale, PA)
- D. M. Gage, K. S. Yim, A. Al-Bayati, A. Demos, H. M'Saad, and R. H. Dauskardt, Proceedings of Advanced Metallization Conference (Materials Research Society, Warrendale, PA, 2008), p. 433.
- (2008) Proceedings of Advanced Metallization Conference , pp. 433
- Gage, D.M.¹ Yim, K.S.² Al-Bayati, A.³ Demos, A.⁴ M'Saad, H.⁵ Dauskardt, R.H.⁶

15
- 0027575198
- 0013-4651, 10.1149/1.2056209
- H. Namatsu and K. Minegishi, J. Electrochem. Soc. 0013-4651 140, 1121 (1993). 10.1149/1.2056209
- (1993) J. Electrochem. Soc. , vol.140 , pp. 1121
- Namatsu, H.¹ Minegishi, K.²

16
- 33846700734
- Thermomechanical properties of thin organosilicate glass films treated with ultraviolet-assisted cure
- DOI 10.1016/j.actamat.2006.10.008, PII S1359645406007282
- F. Iacopi, G. Beyer, Y. Travaly, C. Waldfried, D. M. Gage, R. H. Dauskardt, K. Houthoofd, P. Jacobs, P. Adriaensens, K. Schulze, S. E. Schulz, S. List, and G. Carlotti, Acta Mater. 55, 1407 (2007). 10.1016/j.actamat.2006.10. 008 (Pubitemid 46188414)
- (2007) Acta Materialia , vol.55 , Issue.4 , pp. 1407-1414
- Iacopi, F.¹ Beyer, G.² Travaly, Y.³ Waldfried, C.⁴ Gage, D.M.⁵ Dauskardt, R.H.⁶ Houthoofd, K.⁷ Jacobs, P.⁸ Adriaensens, P.⁹ Schulze, K.¹⁰ Schulz, S.E.¹¹ List, S.¹² Carlotti, G.¹³

17
- 40849118377
- 0021-8979, 10.1063/1.2844483
- A. Grill, D. Edelstein, M. Lane, V. Patel, S. Gates, D. Restaino, and S. Molis, J. Appl. Phys. 0021-8979 103, 054104 (2008). 10.1063/1.2844483
- (2008) J. Appl. Phys. , vol.103 , pp. 054104
- Grill, A.¹ Edelstein, D.² Lane, M.³ Patel, V.⁴ Gates, S.⁵ Restaino, D.⁶ Molis, S.⁷

18
- 0000424502
- 0003-6935, 10.1364/AO.25.001958
- C. A. Mack, Appl. Opt. 0003-6935 25, 1958 (1986). 10.1364/AO.25.001958
- (1986) Appl. Opt. , vol.25 , pp. 1958
- MacK, C.A.¹

19
- 0032148208
- Adhesion and debonding of multi-layer thin film structures
- DOI 10.1016/S0013-7944(98)00052-6, PII S0013794498000526
- R. H. Dauskardt, M. Lane, Q. Ma, and N. Krishna, Eng. Fract. Mech. 0013-7944 61, 141 (1998). 10.1016/S0013-7944(98)00052-6 (Pubitemid 29111653)
- (1998) Engineering Fracture Mechanics , vol.61 , Issue.1 , pp. 141-162
- Dauskardt, R.H.¹ Lane, M.² Ma, Q.³ Krishna, N.⁴

20
- 0035239685
- 0884-2914, 10.1557/JMR.2001.0037
- R. J. Hohlfelder, D. A. Maidenberg, R. H. Dauskardt, Y. Wei, and J. W. Hutchinson, J. Mater. Res. 0884-2914 16, 243 (2001). 10.1557/JMR.2001.0037
- (2001) J. Mater. Res. , vol.16 , pp. 243
- Hohlfelder, R.J.¹ Maidenberg, D.A.² Dauskardt, R.H.³ Wei, Y.⁴ Hutchinson, J.W.⁵

21
- 18444391842
- 0925-9635, 10.1016/j.diamond.2004.11.027
- C. W. Chen, C. C. Haung, Y. Y. Lin, L. C. Chen, K. H. Chen, and W. F. Su, Diamond Relat. Mater. 0925-9635 14, 1010 (2005). 10.1016/j.diamond.2004.11.027
- (2005) Diamond Relat. Mater. , vol.14 , pp. 1010
- Chen, C.W.¹ Haung, C.C.² Lin, Y.Y.³ Chen, L.C.⁴ Chen, K.H.⁵ Su, W.F.⁶

22
- 32944463013
- Photoconductivity and highly selective ultraviolet sensing features of amorphous silicon carbon nitride thin films
- DOI 10.1063/1.2178406
- C. W. Chen, C. C. Haung, Y. Y. Lin, W. F. Su, L. C. Chen, and K. H. Chen, Appl. Phys. Lett. 0003-6951 88, 073515 (2006). 10.1063/1.2178406 (Pubitemid 43261876)
- (2006) Applied Physics Letters , vol.88 , Issue.7 , pp. 073515
- Chen, C.-W.¹ Huang, C.-C.² Lin, Y.-Y.³ Su, W.-F.⁴ Chen, L.-C.⁵ Chen, K.-H.⁶

23
- 69249191369
- 0163-1918.
- M. Tada, H. Yamamoto, F. Ito, M. Narihiro, M. Ueki, N. Inoue, M. Abe, S. Saito, T. Takeuchi, N. Furutake, T. Onodera, J. Kawahara, K. Arai, Y. Kasama, T. Taiji, M. Tohara, M. Sekine, and Y. Hayashi, Tech. Dig.-Int. Electron Devices Meet. 0163-1918 2006, 346781.
- Tech. Dig. - Int. Electron Devices Meet. , vol.2006 , pp. 346781
- Tada, M.¹ Yamamoto, H.² Ito, F.³ Narihiro, M.⁴ Ueki, M.⁵ Inoue, N.⁶ Abe, M.⁷ Saito, S.⁸ Takeuchi, T.⁹ Furutake, N.¹⁰ Onodera, T.¹¹ Kawahara, J.¹² Arai, K.¹³ Kasama, Y.¹⁴ Taiji, T.¹⁵ Tohara, M.¹⁶ Sekine, M.¹⁷ Hayashi, Y.¹⁸

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