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Volumn 12, Issue 7, 2009, Pages

Device characteristics of amorphous indium gallium zinc oxide tfts sputter deposited with different substrate biases

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; DEVICE CHARACTERISTICS; DIFFERENT SUBSTRATES; ENERGETIC ION; FIELD-EFFECT MOBILITIES; INDIUM GALLIUM ZINC OXIDES; NEGATIVE GATE; OFF-STATE CURRENT; RADIO FREQUENCIES; SUBSTRATE BIAS; SUBTHRESHOLD;

EID: 69149102625     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3129505     Document Type: Article
Times cited : (12)

References (16)
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  • 4
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  • 8
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    • Electrical and microstructural characterization of molybdenum tungsten electrodes using a combinatorial thin film sputtering technique
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.