Electrical and microstructural characterization of molybdenum tungsten electrodes using a combinatorial thin film sputtering technique

Journal of Applied Physics

Volumn 97, Issue 5, 2005, Pages

  Jun, Seung Ik ^a   Rack, Philip D ^a   McKnight, Timothy E ^b   Melechko, Anatoli V ^b   Simpson, Michael L ^b  

^a University of Tennessee Knoxville   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL STRESSES; DISLOCATION RESISTIVITY; ENERGETIC SPECIES; MICROSTRUCTURAL PROPERTIES;

COMPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRODES; ELECTROMIGRATION; ELECTRON SCATTERING; MAGNETRON SPUTTERING; MICROSTRUCTURE; MOLYBDENUM COMPOUNDS; THIN FILM TRANSISTORS;

THIN FILMS;

EID: 20444436339     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1855395     Document Type: Article

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