Direct-current substrate bias effects on amorphous silicon sputter-deposited films for thin film transistor fabrication

Applied Physics Letters

Volumn 87, Issue 13, 2005, Pages 1-3

  Jun, Seung Ik ^a   Rack, Philip D ^a   McKnight, Timothy E ^b   Melechko, Anatoli V ^b   Simpson, Michael L ^b  

^a University of Tennessee   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT RATIO; DIRECT CURRENT SUBSTRATES;

AMORPHOUS SILICON; SPUTTER DEPOSITION; THIN FILM TRANSISTORS; THIN FILMS; TRANSCONDUCTANCE;

DC TRANSFORMERS;

EID: 28344440590     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2061860     Document Type: Article

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