Deposition and characterization of ZnO thin films by modified pulsed-spray pyrolysis

Semiconductor Science and Technology

Volumn 24, Issue 8, 2009, Pages

  Thilakan, Periyasamy ^a   Radheep, D Mohan ^a   Saravanakumar, K ^a   Sasikala, G ^b  

^a VALLIAMMAI ENGINEERING COLLEGE   (India)

^b ANNA UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; BAND GAPS; CARRIER GAS; GLASS SUBSTRATES; NANO-CRYSTALLINE STRUCTURES; P-TYPE CONDUCTIVITY; PROBE MEASUREMENTS; RATE OF DEPOSITION; RESISTIVITY VALUES; SPRAY DEPOSITION; X-RAY ANALYSIS; ZNO; ZNO THIN FILM;

DEPOSITION RATES; ENERGY GAP; NANOCRYSTALLINE MATERIALS; OXIDE FILMS; SEMICONDUCTING ZINC COMPOUNDS; SPRAY PYROLYSIS; THIN FILMS; ZINC; ZINC OXIDE;

DEPOSITION;

EID: 68949110082     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/24/8/085020     Document Type: Article

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