Stable p-ZnO thin films by oxygen control using reverse spray dynamics

Solid State Communications

Volumn 133, Issue 4, 2005, Pages 245-248

  Hazra, S K ^a   Basu, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

A. p Zno; B. Annealing; B. Oxygen control; D. Stoichiometry

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; HALL EFFECT; PHOSPHORUS; POLYCRYSTALLINE MATERIALS; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ANNEALING CONDITIONS; DEPOSITION TEMPERATURE; OXYGEN CONTROL; P-ZNO;

OXYGEN;

EID: 10844227228     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2004.11.002     Document Type: Article

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