Effect of hydrogen doping in ZnO thin films by pulsed DC magnetron sputtering

Applied Surface Science

Volumn 255, Issue 22, 2009, Pages 9010-9014

  Park, Young Ran ^a   Kim, Juho ^b   Kim, Young Sung ^c  

^a Konkuk University   (South Korea)

^b Korea Research Institute of Chemical Technology   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Film; FT IR; Hydrogen effect; Micro Raman; Shallow donors; Zinc oxide (ZnO)

Indexed keywords

ATOMS; CARRIER CONCENTRATION; CRYSTAL DEFECTS; CRYSTAL IMPURITIES; FILMS; HYDROGEN; HYDROGEN BONDS; II-VI SEMICONDUCTORS; METALLIC FILMS; OPTICAL FILMS; OPTICAL LATTICES; SEMICONDUCTOR DOPING; ZINC OXIDE;

FREE CARRIER CONCENTRATION; HYDROGEN EFFECT; INTERSTITIAL HYDROGEN; MICRO RAMAN SPECTROSCOPY; MICRO-RAMAN; PULSED DC MAGNETRON SPUTTERING; SHALLOW DONORS; ZINC OXIDE (ZNO);

THIN FILMS;

EID: 68649121815     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.06.083     Document Type: Article

References (44)

1. Look D.C. Mater. Sci. Eng. B 80 (2001) 383
2. Molnar R.J. Semiconductors and Semimetals 57 (1999), Academic Press, San Diego
3. Minami T. MRS Bull. 25 (2000) 38
4. Nuruddin A., and Abelson J.R. Thin Solid Films 394 (2001) 49
5. Wager J.F. Science 300 (2003) 1245
6. Martin P.M., Good M.S., Johnston J.W., Posakony G.J., Bond L.J., and Crawford S.L. Thin Solid Films 379 (2000) 253
7. Look D.C., Hemsky J.W., and Sizelove J.R. Phys. Rev. Lett. 82 (1999) 2552
8. Van de Walle C.G. Phys. Rev. Lett. 85 (2000) 1012
9. Van de Walle C.G. Phys. Rev. B 66 (2002) 165205
10. Van de Walle C.G. Phys. Status Solid B 229 (2002) 221
11. Van de Walle C.G. Appl. Phys. Lett. 86 (2005) 122107
12. Van de Walle C.G. Nat. Mater. 6 (2007) 44
13. Van de Walle C.G. Nature (Lond.) 423 (2003) 626
14. Thomas D.G., and Lander J.J. J. Chem. Phys. 25 (1956) 1136
15. Hutson A.R. Phys. Rev. 108 (1957) 222
16. Thomas D.G. J. Phys. Chem. Solids 10 (1959) 47
17. Hofmann D.M., Hofstaetter A., Leiter F., Zhou H., Henecker F., Meyer B.K., Orlinskii S.B., Schmidt J., and Baranov P.G. Phys. Rev. Lett. 88 (2002) 045504
18. Shimomura K., Nishiyama K., and Kadono R. Phys. Rev. Lett. 89 (2002) 255505
19. Cox S.F.J., Davis E.A., Cottrell S.P., King P.J.C., Lord J.S., Gil J.M., Alberto H.V., Vilão R.C., Piroto Duarte J., Ayres de Campos N., Weidinger A., Lichti R.L., and Irvine S.J.C. Phys. Rev. Lett. 86 (2001) 2601
20. Ohashi N., Ishigaki T., Okada N., Sekiguchi T., Sakaguchi I., and Haneda H. Appl. Phys. Lett. 80 (2002) 2869
21. Baik S.J., Jang J.H., Lee C.H., Cho W.Y., and Lim K.S. Appl. Phys. Lett. 70 (1997) 3516
22. Myong S.Y., and Lim K.S. Appl. Phys. Lett. 82 (2003) 3026
23. Myong S.Y., and Lim K.S. J. Eur. Ceram. Soc. 24 (2004) 139
24. Myong S.Y., and Lim K.S. Sol. Energy Mater. Sol. Cells 86 (2005) 105
25. Myong S.Y., and Lim K.S. J. Crystal Growth 293 (2006) 253
26. Lee J.M., Chang K.M., Kim K.K., Choi W.K., and Park S.J. J. Electrochem. Soc. 148 (2001) G1
27. Jackson G.S., Pan N., Feng M.S., Stillman G.E., Holonyak Jr. N., and Burnham R.D. Appl. Phys. Lett. 51 (1987) 1629
28. Allovon M., Talneau A., Rao E.V.K., Huet F., Alexandre F., Ougazzaden A., Slempkes S., Theys B., and Chevallier J. Appl. Phys. Lett. 71 (1997) 1750
29. Mimila-Arroyo J., Bland S.W., and Chevallier J. Appl. Phys. Lett. 80 (2002) 3632
30. Lavrov E.V., Weber J., Borrnert F., Van de Walle C.G., and Helbig R. Phys. Rev. B 66 (2002) 165205
31. Lavrov E.V., Weber J., Borrnert F., Van de Walle C.G., and Helbig R. Phys. Rev. B 71 (2005) 035205
32. Myong Y., Park S.I., and Lim K.S. Thin Solid Films 513 (2006) 148
33. McCluskey M.D., Jokela S.J., Zhuraviev K.K., Simson P.J., and Lynn K.G. Appl. Phys. Lett. 81 (2002) 3807
34. Wolden C.A., Barnes T.M., Baxter J.B., and Aydil E.S. J. Appl. Phys. 97 (2005) 043522
35. Li X., Keyes B., Asher S., Zhang S.B., Wei S.H., Coutts T.J., Limpijumnong S.L., and Van de Walle C.G. Appl. Phys. Lett. 86 (2005) 122107
36. Burstein E. Phys. Rev. 93 (1954) 632
37. Moss T.S. Proc. Phys. Soc. Lond. Ser. B 67 (1954) 775
38. Alim K.A., Fonoberov V.A., and Balandin A.A. Appl. Phys. Lett. 86 (2005) 053103
39. Wang J.B., Zhong H.M., Li Z.F., and Lu W. Appl. Phys. Lett. 88 (2006) 101913
40. Gorelkinskii Y.V., and Watkins G.D. Phys. Rev. B 69 (2004) 115212
41. Chen Z.Q., Kawasuso A., Xu Y., Naramoto H., Yuan X.L., Sekiguchi T., Suzuki R., and Ohdaira T. J. Appl. Phys. 97 (2005) 013528
42. Calleja J.M., and Cardona M. Phys. Rev. B 16 (1977) 3753
43. Griffin G.L., and Yates J.T. J. Chem. Phys. 77 (1982) 3744
44. Wardle M.G., Goss J.P., and Briddon P.R. Phys. Rev. B 72 (2005) 155108