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Volumn 86, Issue 1, 2005, Pages 105-112

Improvement of electrical and optical properties of ZnO thin films prepared by MOCVD using UV light irradiation and in situ H2 post-treatment

(2) Myong, Seung Yeop a Lim, Koeng Su a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

Hydrogen incorporation; Hydrogen post treatment; MOCVD; Photo MOCVD; ZnO

Indexed keywords

AMORPHOUS SILICON; DURABILITY; ELECTRIC PROPERTIES; ELECTRODES; IRRADIATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; PLASMAS; THIN FILMS;

HYDROGEN INCORPORATION; HYDROGEN POST TREATMENT; PHOTO MOCVD; ZNO;

ZINC OXIDE;

EID: 10444245024 PISSN: 09270248 EISSN: None Source Type: Journal
DOI: 10.1016/j.solmat.2004.06.005 Document Type: Article

Times cited : (19)

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