메뉴 건너뛰기




Volumn 30, Issue 8, 2009, Pages 817-819

Impact of electrode materials on resistive-switching memory programming

Author keywords

Dielectric breakdown; Electrothermal modeling; Nonvolatile memories; Resistive switching memory (RRAM); Transition metal oxide

Indexed keywords

DIELECTRIC BREAKDOWN; ELECTROTHERMAL MODELING; NONVOLATILE MEMORIES; RESISTIVE-SWITCHING MEMORY (RRAM); TRANSITION METAL OXIDE;

EID: 68249159974     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2009.2025061     Document Type: Article
Times cited : (40)

References (21)
  • 2
    • 33748997398 scopus 로고    scopus 로고
    • A low-power nonvolatile switching element based on copper-tungsten oxide solid electrolyte
    • Sep
    • M. N. Kozicki, C. Gopalan, M. Balakrishnan, and M. Mitkova, "A low-power nonvolatile switching element based on copper-tungsten oxide solid electrolyte," IEEE Trans. Nanotechnol., vol. 5, no. 5, pp. 535-544, Sep. 2006.
    • (2006) IEEE Trans. Nanotechnol , vol.5 , Issue.5 , pp. 535-544
    • Kozicki, M.N.1    Gopalan, C.2    Balakrishnan, M.3    Mitkova, M.4
  • 5
    • 59849099356 scopus 로고    scopus 로고
    • Filament conduction and reset mechanism in NiO-based resistive-switching memory (RRAM) devices
    • Feb
    • U. Russo, D. Ielmini, C. Cagli, and A. L. Lacaita, "Filament conduction and reset mechanism in NiO-based resistive-switching memory (RRAM) devices," IEEE Trans. Electron Devices, vol. 56, no. 2, pp. 186-192, Feb. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.2 , pp. 186-192
    • Russo, U.1    Ielmini, D.2    Cagli, C.3    Lacaita, A.L.4
  • 7
    • 0035443262 scopus 로고    scopus 로고
    • On the switching behaviour of post-breakdown conduction in ultra-thin SiO2 films
    • Sep
    • T. P. Chen, M. S. Tse, X. Zeng, and S. Fung, "On the switching behaviour of post-breakdown conduction in ultra-thin SiO2 films," Semicond. Sci. Technol., vol. 16, no. 9, pp. 793-797, Sep. 2001.
    • (2001) Semicond. Sci. Technol , vol.16 , Issue.9 , pp. 793-797
    • Chen, T.P.1    Tse, M.S.2    Zeng, X.3    Fung, S.4
  • 9
    • 59849127081 scopus 로고    scopus 로고
    • Self-accelerated thermal-dissolution model for reset programming in unipolar resistive switching memory (RRAM) devices
    • Feb
    • U. Russo, D. Ielmini, C. Cagli, and A. L. Lacaita, "Self-accelerated thermal-dissolution model for reset programming in unipolar resistive switching memory (RRAM) devices," IEEE Trans. Electron Devices, vol. 56, no. 2, pp. 193-200, Feb. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.2 , pp. 193-200
    • Russo, U.1    Ielmini, D.2    Cagli, C.3    Lacaita, A.L.4
  • 13
    • 64549145384 scopus 로고    scopus 로고
    • Evidence for threshold switching in the set process of NiO-based RRAM and physical modeling for set, reset, retention and disturb prediction
    • Paper 12.4
    • C. Cagli, D. Ielmini, F. Nardi, and A. L. Lacaita, "Evidence for threshold switching in the set process of NiO-based RRAM and physical modeling for set, reset, retention and disturb prediction," in IEDM Tech. Dig., 2008, Paper 12.4.
    • (2008) IEDM Tech. Dig
    • Cagli, C.1    Ielmini, D.2    Nardi, F.3    Lacaita, A.L.4
  • 14
    • 43549126477 scopus 로고    scopus 로고
    • Resistive switching in transition metal oxides
    • Jun
    • A. Sawa, "Resistive switching in transition metal oxides," Mater. Today, vol. 11, no. 6, pp. 28-36, Jun. 2008.
    • (2008) Mater. Today , vol.11 , Issue.6 , pp. 28-36
    • Sawa, A.1
  • 15
    • 55149086159 scopus 로고    scopus 로고
    • Resistance switching and formation of a conductive bridge in metal/ binary oxide/metal structure for memory devices
    • Aug
    • K. Fujiwara, T. Nemoto, M. J. Rozenberg, Y. Nakamura, and H. Takagi, "Resistance switching and formation of a conductive bridge in metal/ binary oxide/metal structure for memory devices," Jpn. J. Appl. Phys., vol. 47, no. 8, pp. 6266-6271, Aug. 2008.
    • (2008) Jpn. J. Appl. Phys , vol.47 , Issue.8 , pp. 6266-6271
    • Fujiwara, K.1    Nemoto, T.2    Rozenberg, M.J.3    Nakamura, Y.4    Takagi, H.5
  • 16
    • 50249141738 scopus 로고    scopus 로고
    • Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM
    • U. Russo, D. Ielmini, C. Cagli, A. L. Lacaita, S. Spiga, C. Wiemer, M. Perego, and M. Fanciulli, "Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM," in IEDM Tech. Dig., 2007, pp. 775-778.
    • (2007) IEDM Tech. Dig , pp. 775-778
    • Russo, U.1    Ielmini, D.2    Cagli, C.3    Lacaita, A.L.4    Spiga, S.5    Wiemer, C.6    Perego, M.7    Fanciulli, M.8
  • 17
    • 43749088059 scopus 로고    scopus 로고
    • Sub-100 μA reset current of nickel oxide resistive memory through control of filamentary conductance by current limit of MOSFET
    • May
    • Y. Sato, K. Tsunoda, K. Kinoshita, H. Noshiro, M. Aoki, and Y. Sugiyama, "Sub-100 μA reset current of nickel oxide resistive memory through control of filamentary conductance by current limit of MOSFET," IEEE Trans. Electron Devices, vol. 55, no. 5, pp. 1185-1191, May 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.5 , pp. 1185-1191
    • Sato, Y.1    Tsunoda, K.2    Kinoshita, K.3    Noshiro, H.4    Aoki, M.5    Sugiyama, Y.6
  • 20
    • 0036712468 scopus 로고    scopus 로고
    • Polarity-dependent dielectric breakdown-induced epitaxy (DBIE) in Si MOSFETs
    • Sep
    • C. H. Tung, K. L. Pey, W. H. Lin, and M. K. Radhakrishnan, "Polarity-dependent dielectric breakdown-induced epitaxy (DBIE) in Si MOSFETs," IEEE Electron Device Lett., vol. 23, no. 9, pp. 526-528, Sep. 2002.
    • (2002) IEEE Electron Device Lett , vol.23 , Issue.9 , pp. 526-528
    • Tung, C.H.1    Pey, K.L.2    Lin, W.H.3    Radhakrishnan, M.K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.